Buried channel waveguides in Yb-doped KY(WO4)2 crystals fabricated by femtosecond laser irradiation

Borca, Camelia N.; Apostolopoulos, Vasilis; Gardillou, Florent; Limberger, H.G.; Pollnau, Markus; Salathé, R. P.

doi:10.1016/j.apsusc.2007.02.106

Cited by 33 publications

(22 citation statements)

References 16 publications

(20 reference statements)

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“…Channel waveguides have been demonstrated in Yb:KYW by strip loading an LPE grown planar waveguide layer where laser performance was reported with a threshold of 82 mW of absorbed pump power and a maximum output power of 14 mW at 1025 nm [19]. Using an ultrashort pulse laser writing technique channel waveguides were fabricated successfully in Yb:KYW demonstrating propagation losses in the range of 2-2.5 dBcm −1 at 1 µm [20] and in KGdW with 1.8 dBcm…”

Section: Introductionmentioning

confidence: 99%

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Ultrafast laser inscribed Yb:KGd(WO_4)_2 and Yb:KY(WO_4)_2 channel waveguide lasers

Bain¹,

Lagatsky²,

Thomson³

et al. 2009

Opt. Express

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Abstract:We demonstrate laser action in diode-pumped microchip monolithic cavity channel waveguides of Yb:KGd(WO 4 ) 2 and Yb:KY(WO 4 ) 2 that were fabricated by ultrafast laser writing. The maximum output power achieved was 18.6 mW with a threshold of approximately 100 mW from an Yb:KGd(WO 4 ) 2 waveguide laser operating at 1023 nm. The propagation losses for this waveguide structure were measured to be 1.9 dBcm References and links1. K. M. Davis, K. Miura, N. Sugimoto, and K. Hirao, "Writing waveguides in glass with a femtosecond laser,"Opt. Lett. 21(21), 1729-1731 (1996). 2. R. R. Gattass, and E. Mazur, "Femtosecond laser micromachining in transparent materials," Nat. Photonics 2(4), 219-225 (2008). D. Miller, C. Hnatovsky, and R. S. Taylor, "Raman gain from waveguides inscribed in KGd(WO4)2 by high repetition rate femtosecond laser," Appl.

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Section: Introductionmentioning

confidence: 99%

“…The laser beam was focused at a depth of 430 µm into the Yb:KGdW crystal and 360 µm into the Yb:KYW crystal using a × 20 microscope objective with a 0.4 numerical aperture. Pairs of modified tracks were written because this technique had previously been employed to improve confinement and guiding in the central unmodified region [20].…”

Section: Introductionmentioning

confidence: 99%

Ultrafast laser inscribed Yb:KGd(WO_4)_2 and Yb:KY(WO_4)_2 channel waveguide lasers

Bain¹,

Lagatsky²,

Thomson³

et al. 2009

Opt. Express

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show abstract

“…At present, domestic and foreign scholars have already carried out extensive researchs on femtosecond laser micro-machining in the fields of fabrication of micro-optics, microelectronics, micro-mechanical devices and biochemical analysis system, and the fabricated microdevices including waveguides [1][2][3], gratings [4,5], micro-electrode [6], Mach-Zehnder interferometer (MZI) [7], and other simple micro-patterns. Moreover, the fabrications of optical switch [8], 3D optical circuit [9,10], multi-layered grating [11] and other complex micro-structures have been reported.…”

mentioning

confidence: 99%

Research on the technology of femtosecond laser micromachining based on image edge tracing

et al. 2010

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Aiming at fabrication of complex microstructures and micro-patterns, a kind of femtosecond laser micromachining technology based on the BMP image edge tracing was proposed. We introduced the general principle of this technology and discussed the implementation of the machining paths extraction, optimization, tracing and the feedback of the machining procession in detail. On the basis of this technology, control software for femtosecond laser micromachining was developed. Furthermore, we have accomplished the fabrication of complicated two-dimensional (2D) micro-patterns on a copper thin film. The results indicate that this technology can be used for digital control micromachining of complex patterns or microstructures at micron and submicron scales by femtosecond laser. femtosecond laser, image edge detection, micromachining, micro-pattern Citation: Zhang D S, Chen F, Liu H W, et al. Research on the technology of femtosecond laser micromachining based on image edge tracing.Femtosecond laser micromachining is a new type of micromanufacturing technology with many incomparable unique advantages. Firstly, femtosecond laser pulse duration is so short (10 −15 s) that it enables us to obtain extremely high peak power at relative low pulse energy and thereby greatly reduces the energy required for fabrication. For example, when a 10 fs laser pulse at 0.3 mJ pulse energy focuses on a micro-region with diameter of 2 μm, the peak power in the focal spot would reach 10 18 W/cm 2 . Secondly, the energy of femtosecond laser is concentrated in the range of the skin depth, resulting in minimal heat affected zone. And there will be no trace of melting and re-solidification left after the ablation process, accordingly reducing or even eliminating many negative influences caused by the thermal effect in traditional processing. Thirdly, the nonlinear absorption of femtosecond laser can make laser focus into any position inside transparent bulk materials, thus three-dimensional (3D) microfabrication can be realized. In addition, because of the accurate laser ablation threshold for each material, laser energy can be controlled to equal to or slightly higher than the ablation threshold so as to carry on sub-micron fabrication beyond the diffraction limit. With enough short pulse duration and enough high peak power, the femtosecond laser can carry on 2D and 3D fine processing, repair and modification of various materials, especially for high hardness, high melting point, corrosion resistant and brittle materials (such as metals, glasses, ceramics etc.). At present, domestic and foreign scholars have already carried out extensive researchs on femtosecond laser micro-machining in the fields of fabrication of micro-optics, microelectronics, micro-mechanical devices and biochemical analysis system, and the fabricated microdevices including waveguides [1-3], gratings [4,5], micro-electrode [6], Mach-Zehnder interferometer (MZI) [7], and other simple micro-patterns. Moreover, the fabrications of optical switch [8], 3D optical circuit [9,10], ...

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“…The method was introduced by Davis et al [101] and it had been applied on a wide range of materials. Channel waveguide produced by this method on KGd(WO4)2:Yb 3+ [97] and KY(WO4)2:Yb 3+ [97,98] had been reported. A double track writing is required as the process itself induces a reduction of index of refraction on the written track in potassium double tungstates.…”

Section: Waveguides Based On Potassium Double Tungstatesmentioning

confidence: 96%

“…The reported potassium double tungstate waveguide structures which provide two dimensional wave confinement are shown in Figure 2.7. For the ease of discussion they will be referred based on the fabrication method: (a) ultra-fast laser writing [97,98], (b) micro-structured epitaxy layer [99], and (c) epitaxial growth on micro-structured substrate [100].…”

Section: Waveguides Based On Potassium Double Tungstatesmentioning

confidence: 99%

Potassium double tungstate waveguides with high ytterbium concentration for optical amplification

Yong

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Cover design: Three dimensional visualization of optical amplification in potassium double tungstate waveguide layer as a signal beam propagates from the top surface to the bottom surface. The model has a radius equivalent to about twenty times the optical beam's radius and only a quarter of the body is shown. The intensity of the signal beam is represented by the color spectrum (red being lowest and blue being highest). The wire frame is generated based on finite element mesh grids.

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Buried channel waveguides in Yb-doped KY(WO4)2 crystals fabricated by femtosecond laser irradiation

Cited by 33 publications

References 16 publications

Ultrafast laser inscribed Yb:KGd(WO_4)_2 and Yb:KY(WO_4)_2 channel waveguide lasers

Ultrafast laser inscribed Yb:KGd(WO_4)_2 and Yb:KY(WO_4)_2 channel waveguide lasers

Research on the technology of femtosecond laser micromachining based on image edge tracing

Potassium double tungstate waveguides with high ytterbium concentration for optical amplification

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