Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography

Grzywacz, Hubert; Jenczyk, Piotr; Milczarek, Michał; Michałowski, Marcin; Jarząbek, Dariusz M.

doi:10.3390/ma14216639

Cited by 5 publications

(5 citation statements)

References 35 publications

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“…In fact, viscosity experiments on thin films (80 – 500 nm) of PMMA ( T g ≈ 82°C) indicate a gradient layer structure in which the viscosity decreases from the glass/polymer to the polymer/air interface with an immobile layer adjacent to the glass and an intermediate glassy bulk layer and a mobile top layer, , a picture that fits our observations. T g increases by few °C when approaching the glass interface below a 100 nm distance; bulk viscosity is in the range of 10 9 Pa s, and viscous flow viscosities, i.e., of films at temperatures exceeding the polymer’s bulk T g , are in the 10 2 – 10 5 Pa s range . Our experiments demonstrate that SRG formation stops at the mobile layer and bulk layer interface, wherein the photonic force is unable to overcome the viscous force due to the large viscosity of the bulk layer.…”

Section: Resultsmentioning

confidence: 75%

“…T g increases by few °C when approaching the glass interface below a 100 nm distance; bulk viscosity is in the range of 10 9 Pa s, and viscous flow viscosities, i.e., of films at temperatures exceeding the polymer's bulk T g , are in the 10 2 − 10 5 Pa s range. 58 Our experiments demonstrate that SRG formation stops at the mobile layer and bulk layer interface, wherein the photonic force is unable to overcome the viscous force due to the large viscosity of the bulk layer. We will go on to discuss such competition between forces.…”

Section: Film Thicknessmentioning

confidence: 79%

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Efficient Surface Structuring of Photomechanical Solid Polymers by Near-Zero Light Absorption

2023

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Mechanics enabled by photon absorption generates work from materials and is perhaps one of the most important applications of light-active matter, which mediates an intensity-tostress transduction and moves in intensity gradients. Photomechanics can be put at work in surface structuring of materials, which has applications in several areas of science and engineering including photonics and biology and medicine. We demonstrate that photosensitive materials can be unexpectedly micro-and nanotextured by single-step irradiation with weakly absorbed lowpower red light. We report highly efficient surface structuring induced by interference patterns of two coherent nonresonant red (wavelength of 632.8 nm), less than 5 mW, laser beams operating in the near-zero absorption tail of azo-polymer films with optical densities in the 0.02−0.09 range, i.e., 80 − 95% light transmission. The heights of the observed structures are comparable to those obtained by resonant absorption, a feature that is counterintuitive and thus never reported to date. Low-and high-energy n − π* and π − π* excitations of the azo dye are equally efficient in inducing isomerization and mass motion of polymers. Our work is of central importance to photomechanics, and to surface texturing in particular, since it demonstrates that efficient material motion can be driven by weekly absorbed, i.e., low-energy excitation, low-power red light, in solid films of polymers well below the glass transition temperature, pointing to possible biological and cost-effective industrial applications.

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Section: Resultsmentioning

confidence: 75%

Section: Film Thicknessmentioning

confidence: 79%

Efficient Surface Structuring of Photomechanical Solid Polymers by Near-Zero Light Absorption

2023

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“…Similarly, for the vacuum evaporation process, the inputs encompass the evaporation amount and resistance evaporation current, yielding the film thickness as the output. The predicted film thicknesses from both approaches are aggregated to obtain the overall predicted film thickness of the composite film [32,33].…”

Section: Feature Selection and Data Segmentationmentioning

confidence: 99%

Design and Study of Composite Film Preparation Platform

Li,

et al. 2024

Crystals

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This study aims to develop equipment for the preparation of composite films and successfully implement a film thickness prediction function. During the research process, we segmented the mechanical structure of the composite thin film preparation equipment into distinct modules, completed the structural design of the core module, and validated the stability of the process chamber, as well as the reasonableness of the strength and stiffness through simulation. Additionally, we devised a regression model for predicting the film thickness of composite films. The input features for the model included the sputtering air pressure, sputtering current, and sputtering time for magnetron sputtering process samples, as well as the evaporation volume and evaporation current for vacuum evaporation process samples. Simultaneously, the output features were the film thickness for both process samples. Subsequently, we established the designed composite film preparation equipment and conducted experimental verification. During the experiments, we successfully prepared Cr-Al composite films and utilized AFM for surface morphology analysis. The results confirmed the excellent performance of the Cr-Al composite films produced by the equipment, demonstrating the reliability of the equipment.

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“…In the field of biomedicine, SMNIL technology is widely used to construct micro and nanoscale biochips and laboratory on-a-chips, which play important roles in disease diagnosis, drug screening, biological analysis, and other fields [21][22][23].…”

Section: Biomedical Fieldmentioning

confidence: 99%

Application Progress of Soft Film Nanoimprint Lithography Technology

Zhiwei

2024

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Soft Film Nanoimprint Lithography (SMNIL) is an emerging nanomanufacturing technology that excels in achieving precise transfer of nanoscale patterns to substrate materials using flexible films as molds. This versatile technology exhibits promising applications in semiconductors, biopharmaceuticals, and optoelectronics owing to its cost-effectiveness, high resolution, and scalability. In semiconductor manufacturing, SMNIL has notably enhanced chip integration and performance. In biomedicine, it is utilized for fabricating micro-and nanoscale biochips, aiding in disease diagnosis and drug screening. In optoelectronics, SMNIL contributes to the production of optical waveguides, micro/nano gratings, and organic light-emitting diodes (OLEDs), enhancing equipment performance and reducing costs. Despite its advantages, challenges persist in template durability, processing accuracy, and large-scale production for SMNIL. Future developments should focus on enhancing the performance of soft film materials, developing more efficient embossing equipment, and expanding application scopes. SMNIL holds immense potential in the field of nanomanufacturing, and addressing these challenges will further propel its widespread adoption.

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Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography

Cited by 5 publications

References 35 publications

Efficient Surface Structuring of Photomechanical Solid Polymers by Near-Zero Light Absorption

Efficient Surface Structuring of Photomechanical Solid Polymers by Near-Zero Light Absorption

Design and Study of Composite Film Preparation Platform

Application Progress of Soft Film Nanoimprint Lithography Technology

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