Building and Manipulating Three-Dimensional and Linked Two-Dimensional Structures of Nanoparticles Using Scanning Force Microscopy

Resch, R.; Baur, C.; Bugacov, Alejandro; Koel, Bruce E.; Madhukar, A.; Requicha, and Aristides A. G.; Will, Peter

doi:10.1021/la980386f

Cited by 78 publications

(36 citation statements)

References 18 publications

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“…We have demonstrated two variants of this approach: 1) first deposit the particles, position them, and then immerse the sample in the di-thiol solution to link them or 2) deposit the particles, apply the thiols, and then manipulate the particles into contact, thus linking them. We also have shown that it is possible to push a group of nanoparticles linked by di-thiols as a whole [54], [55]. These results demonstrate hierarchical assembly at the nanoscale, i.e., the construction of assemblies of components, which are themselves (sub-) assemblies of other components or of primitive building blocks.…”

Section: E Linking and Embeddingmentioning

confidence: 53%

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Nanorobots, NEMS, and Nanoassembly

2003

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Section: E Linking and Embeddingmentioning

confidence: 53%

“…We have investigated several approaches to linking. The first uses covalent (i.e., chemical) bonding to a linker [54], [55]. For example, gold particles can be connected with di-thiols.…”

Section: E Linking and Embeddingmentioning

confidence: 99%

Nanorobots, NEMS, and Nanoassembly

2003

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“…The probe tip can also be used to grab weakly adsorbed molecules or small particles from a surface, and transfer them to another region of the same substrate to generate highly ordered structures. [14] However, this strategy seems to be less frequently used than the former one because the grabbing, moving, and unloading steps can be slow and hard to control.…”

Section: Writing With a Rigid Stylusmentioning

confidence: 99%

Patterning: Principles and Some New Developments

Geißler

Xia²

2004

Advanced Materials

603

461

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This article provides an overview of various patterning methodologies, and it is organized into three major sections: generation of patterns, replication of patterns, and three‐dimensional patterning. Generation of patterns from scratch is usually accomplished by serial techniques that are able to provide arbitrary features. The writing process can be carried out in many different ways. It can be achieved using a rigid stylus; or a focused beam of photons, electrons, and other energetic particles. It can also be accomplished using an electrical or magnetic field; or through localized add‐on of materials such as a liquid‐like ink from an external source. In addition, some ordered but relatively simple patterns can be formed by means of self‐assembly. In replication of patterns, structural information from a mask, master, or stamp is transferred to multiple copies with the use of an appropriate material. The patterned features on a mask are mainly used to direct a flux of radiation or physical matter from a source onto a substrate, whereas a master/stamp serves as the original for replication based on embossing, molding, or printing. The last section of this article deals with three‐dimensional patterning, where both vertical and lateral dimensions of a structure need to be precisely controlled to generate well‐defined shapes and profiles. The article is illustrated with various examples derived from recent developments in this field.

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“…In addition to the imaging mode, an operator can command the motion of the AFM tip in an arbitrary manner, thus to manipulate nanoscale objects with nanoscale precision. Since the first try using AFM to manipulate nano-objects [2], many research groups have been working on AFM-based nanomanipulation [3]- [7]. Tasks such as pushing, pulling, cutting, bending, kinking, rolling, and sliding have been reported in the literature [3]- [6], [8]- [10].…”

Section: Introductionmentioning

confidence: 99%

Drift Compensation in AFM-Based Nanomanipulation by Strategic Local Scan

Wang

Liu

2012

IEEE Trans. Automat. Sci. Eng.

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Abstract-The drift distorts the atomic force microscopy (AFM) images as the time taken to acquire a complete AFM image is relatively long (a few minutes). As the AFM image is used as a reference for most manipulation mechanisms, the image distorted by drift will cause problems for AFM-based manipulation because the displayed positions of the objects under nanomanipulation do not match their actual locations. The drift during manipulation, similarly, will further exacerbate the mismatch between the displayed positions and the actual locations. Such mismatch is a major hurdle to achieve automation in AFM-based nanomanipulation. Without proper compensation, manipulation based on a wrong displayed location of the object often fails. In this paper, we present an algorithm to identify and eliminate the drift-induced distortion in the AFM image by applying a strategic local scan method. Briefly, after an AFM image is captured, the entire image is divided into several parts along vertical direction. A quick local scan is performed in each part of the image to measure the drift value in that very part. In this manner, the drift value is calculated in a small local area instead of the global image. Thus, the drift can be more precisely estimated and the actual position of the objects can be more accurately identified. In this paper, we also present the strategy to constantly compensate the drift during manipulation. By applying local scan on a single fixed feature in the AFM image frequently, the most current positions of all objects can be displayed in the augmented reality for real-time visual feedback.Notes to Practitioners-Fabrication of nanoscale devices by AFM-based manipulation has attracted much attention recently. However, it is a sequential approach and therefore the throughput is low. To increase the efficiency of AFM-based nanomanipulation, automation is considered to be the ultimate solution. Unfortunately, automation in AFM-based nanomanipulation is facing several technical hurdles. The thermal drift is one of them. Because of the presence of thermal expansion and contraction, the relative position between the tip and the sample undergoes drift with respect to time. Therefore, the AFM images are often distorted due to the thermal drift because the time taken to acquire a complete AFM image is in the range of minutes. This paper tries to tackle this problem by compensating the thermal drift through direct measurement of the thermal drift by local scan. The direct measurement not only can be used to correct Manuscript received December 07, 2011; revised June 14, 2012; accepted July 20, 2012 the drift-induced distortion in the initial AFM image, it can also be used to compensate the real-time drift during manipulation. Starting from a drift-clean image at the beginning and with drift being compensated in real-time during manipulation, the AFM-based nanomanipulation can be more accurate and efficient. The research results here is one of the important steps to achieve full automation in AFM-based nanomanipulation.

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Building and Manipulating Three-Dimensional and Linked Two-Dimensional Structures of Nanoparticles Using Scanning Force Microscopy

Cited by 78 publications

References 18 publications

Nanorobots, NEMS, and Nanoassembly

Nanorobots, NEMS, and Nanoassembly

Patterning: Principles and Some New Developments

Drift Compensation in AFM-Based Nanomanipulation by Strategic Local Scan

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