Building 3D Micro- and Nanostructures Through Nanoimprint

Cheng, Xing

doi:10.1007/978-1-4419-9822-4_3

Cited by 2 publications

(3 citation statements)

References 86 publications

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“…87,88,89,90 Another potential benefit comes from the ability of nanoimprint to print multiple pattern levels simultaneously, which can result in a significant reduction in the number of process steps needed to complete a device. 91,92,93,94,95 Aside from meeting overlay requirements, the principal obstacle facing the technology is for it to achieve the same throughput and low level of defects 96 as photolithography.…”

Section: Nanoimprint Lithographymentioning

confidence: 99%

“…Pattern placement capabilities close to those of photolithography tools have been achieved by introducing schemes that use controlled deformation of the imprint template. − Such schemes, coupled with improvements in template fabrication processes, are currently suitable for IC manufacturing at feature sizes of ≈20 nm ( i.e. , the 2 x nm nodes). − Another potential benefit comes from the ability of nanoimprint to print multiple pattern levels simultaneously, which can result in a significant reduction in the number of process steps needed to complete a device. − Aside from meeting overlay requirements, the principal obstacle facing the technology is for it to achieve the same throughput and low level of defects as photolithography.…”

Section: Nanoimprint Lithographymentioning

confidence: 99%

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Nanomanufacturing: A Perspective

2016

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Nanomanufacturing, the commercially-scalable and economically-sustainable mass production of nanoscale materials and devices, represents the tangible outcome of the nanotechnology revolution. In contrast to those used in nanofabrication for research purposes, nanomanufacturing processes must satisfy the additional constraints of cost, throughput, and time to market. Taking silicon integrated circuit manufacturing as a baseline, we consider the factors involved in matching processes with products, examining the characteristics and potential of top-down and bottom-up processes, and their combination. We also discuss how a careful assessment of the way in which function can be made to follow form can enable high-volume manufacturing of nanoscale structures with the desired useful, and exciting, properties.

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Section: Nanoimprint Lithographymentioning

confidence: 99%

Section: Nanoimprint Lithographymentioning

confidence: 99%

Nanomanufacturing: A Perspective

2016

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“…This review is complemented by two other recent papers where two important aspects of molding have been presented, the similarities of NIL and LiGA and the description of the NIL process chains [35,36], including the main process steps such as origination, replication and pattern transfer. A range of further 3D micro-and nanostructures based on NIL can be found in [37]. In the following, the toolbox approach for NIL with focus on 3D processes will be presented, followed by applications with 3D features.…”

Section: Introductionmentioning

confidence: 99%

Nanoimprint lithography: 2D or not 2D? A review

Schift

2015

Appl. Phys. A

107

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Nanoimprint lithography (NIL) is more than a planar high-end technology for the patterning of wafer-like substrates. It is essentially a 3D process, because it replicates various stamp topographies by 3D displacement of material and takes advantage of the bending of stamps while the mold cavities are filled. But at the same time, it keeps all assets of a 2D technique being able to pattern thin masking layers like in photon-and electron-based traditional lithography. This review reports about 20 years of development of replication techniques at Paul Scherrer Institut, with a focus on 3D aspects of molding, which enable NIL to stay 2D, but at the same time enable 3D applications which are ''more than Moore.'' As an example, the manufacturing of a demonstrator for backlighting applications based on thermally activated selective topography equilibration will be presented. This technique allows generating almost arbitrary sloped, convex and concave profiles in the same polymer film with dimensions in micro-and nanometer scale.

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Building 3D Micro- and Nanostructures Through Nanoimprint

Cited by 2 publications

References 86 publications

Nanomanufacturing: A Perspective

Nanomanufacturing: A Perspective

Nanoimprint lithography: 2D or not 2D? A review

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