Broadband antireflection coatings for visible and infrared ranges

Lemarquis, Frédéric; Bégou, Thomas; Moreau, Antonin; Lumeau, Julien

doi:10.1007/s12567-019-00266-8

Cited by 15 publications

(10 citation statements)

References 15 publications

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“…The structure we study in the present work has emerged as a solution consistently produced by global optimization algorithms when asked to find the best possible Anti-Reflective Coating (ARC) in normal incidence as a multilayer with two alternating refractive index (1.4 and 1.7 which are typical of the silicon oxynitride we use in the last part of the paper to fabricate the ARC [10] or of biological materials, typically chitin [11]) on top of amorphous hydrogenated silicon layer. In comparison, state of the art ARC generated using specific design algorithms [2,3] are generally extremely efficient, but not regular at all [12,13].…”

Section: Emergence Of the Designmentioning

confidence: 98%

Analysis and fabrication of a photonic crystal based anti-reflective coating for photovoltaics generated by evolutionary optimization

Bennet,

Juillet,

Ibrahim

et al. 2020

Preprint

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We optimize multilayered anti-reflective coatings for photovoltaic devices, using modern evolutionary algorithms. We apply a rigorous methodology to show that a given structure, which is particularly regular, emerge spontaneously in a very systematical way for a very broad range of conditions. The very regularity of the structure allows for a thorough physical analysis of how the designs operate. This allows to understand that the central part is a photonic crystal utilized as a buffer for light, and that the external layers have the purpose of reducing the impedance mismatch between the outer media and the Bloch mode supported by the photonic crystal. This shows how optimization can suggest new design rules and be considered as a source of inspiration. Finally, we fabricate these structures with easily deployable techniques.

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Section: Emergence Of the Designmentioning

confidence: 98%

Analysis and fabrication of a photonic crystal based anti-reflective coating for photovoltaics generated by evolutionary optimization

Bennet,

Juillet,

Ibrahim

et al. 2020

Preprint

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show abstract

“…[ 34,38,39 ] Furthermore, the precision of fabrication is significant only for ARMs that are aimed at transmittance higher than 99%, whereas mistakes in layer thickness during deposition can significantly affect ARCs performance. [ 14,40,41 ]…”

Section: Introductionmentioning

confidence: 99%

Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

Bushunov

Tarabrin

Lazarev

2021

Laser & Photonics Reviews

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Mid‐infrared materials antireflection is in high demand for high‐powered or ultra‐broadband coherent light sources, where conventional antireflection coatings cannot be reliably applied. This work provides a critical review of the recent advances in microstructure fabrication technology for mid‐infrared antireflection applications. Several techniques are reviewed, including direct imprinting, wet and reactive ion etching using conventional photoresist masking, novel colloid crystal masks, and maskless etching, laser‐induced periodic structure formation, and multiple laser ablation method modifications, including femtosecond laser direct writing, direct laser interference ablation, and single pulse ablation. The advantages and drawbacks of the different approaches are discussed in detail to highlight the most promising techniques for the fabrication of antireflection microstructures capable of achieving 99% transmittance in the 2–16 μm range.

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“…Among the deposition machines that are available at Institut Fresnel, the Bühler HELIOS machine is considered as the most appropriate. First, its deposition process is highly stable, and particularly interesting for the deposition of complex coatings with a high layer count, as proved by the filters we manufactured for the IDEFIX, TARANIS or 3MI projects [10][11][12] with more than 100 layers and 25 µm thick. Second, the HELIOS rotating substrate holder has a large diameter, between 460 and 740 mm, which gives, according to the position of the gradient on the substrate relatively to the substrate holder and using a simple masking technique, a 700 mm radius of curvature for variable filters, this value being large enough for our requirements.…”

Section: Introductionmentioning

confidence: 99%

Application of static masking technique in magnetron sputtering technology for the production of linearly variable filters

et al. 2021

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Variable filters are key components for compact spectral imagers. In this paper, we present a method for the fabrication of linearly variable filters based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These filters are obtained by producing a variation of the thickness of all the layers of the coating, using adapted masks placed in between the sputtering targets for the low and high refractive index materials and the substrates. Variable band pass filter from 550 nm up to 1000 nm is demonstrated.

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Broadband antireflection coatings for visible and infrared ranges

Cited by 15 publications

References 15 publications

Analysis and fabrication of a photonic crystal based anti-reflective coating for photovoltaics generated by evolutionary optimization

Analysis and fabrication of a photonic crystal based anti-reflective coating for photovoltaics generated by evolutionary optimization

Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

Application of static masking technique in magnetron sputtering technology for the production of linearly variable filters

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