Broadband and wide-angle antireflective subwavelength microstructures on zinc sulfide fabricated by femtosecond laser parallel multi-beam

Zhang, Fan; Duan, Ji’an; Zhou, Xuelong; Wang, Cong

doi:10.1364/oe.26.034016

Cited by 31 publications

(17 citation statements)

References 44 publications

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Section: Analysis Of Existing Microstructure Fabrication Techniquesmentioning

confidence: 99%

“…Multi‐beam direct laser writing (e); data recalculated to per‐surface transmittance from ref. [125].…”

Section: Analysis Of Existing Microstructure Fabrication Techniquesmentioning

confidence: 99%

“…In ref. [125], femtosecond laser pulses with a central wavelength of 800 nm were generated by a regeneratively amplified Ti:sapphire laser system (Spectra Physics) with a pulse duration of 120 fs and a tunable repetition rate ranging from 1 to 1000 Hz. Before being focused by the 20 × objective lens with numerical aperture 0.45, the laser beam is split spatially by a MLA (period = 150

μ

m, focal length = 5.3 mm).…”

Section: Analysis Of Existing Microstructure Fabrication Techniquesmentioning

confidence: 99%

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Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

Bushunov

Tarabrin

Lazarev

2021

Laser & Photonics Reviews

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Mid‐infrared materials antireflection is in high demand for high‐powered or ultra‐broadband coherent light sources, where conventional antireflection coatings cannot be reliably applied. This work provides a critical review of the recent advances in microstructure fabrication technology for mid‐infrared antireflection applications. Several techniques are reviewed, including direct imprinting, wet and reactive ion etching using conventional photoresist masking, novel colloid crystal masks, and maskless etching, laser‐induced periodic structure formation, and multiple laser ablation method modifications, including femtosecond laser direct writing, direct laser interference ablation, and single pulse ablation. The advantages and drawbacks of the different approaches are discussed in detail to highlight the most promising techniques for the fabrication of antireflection microstructures capable of achieving 99% transmittance in the 2–16 μm range.

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Section: Analysis Of Existing Microstructure Fabrication Techniquesmentioning

confidence: 99%

“…Multi‐beam direct laser writing (e); data recalculated to per‐surface transmittance from ref. [125].…”

Section: Analysis Of Existing Microstructure Fabrication Techniquesmentioning

confidence: 99%

μ

m, focal length = 5.3 mm).…”

Section: Analysis Of Existing Microstructure Fabrication Techniquesmentioning

confidence: 99%

See 1 more Smart Citation

Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

Bushunov

Tarabrin

Lazarev

2021

Laser & Photonics Reviews

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show abstract

“…Moreover, the average spectral transmittance of ASS decreased by 5.1% with a period of 3.6 µm in a broadband from 6 µm to 10 µm. The subwavelength period restrictive condition for perfect antireflection can be deduced from a grating diffraction equation; nonzero diffraction orders disappear in SWMS, and the constrained equation of period with normal incidence light is derived from [1]:…”

Section: The Ass Microhole Array Ablated By Bessel Beammentioning

confidence: 99%

“…and optoelectronic devices (solar cells, photodetectors, light-emitting diodes, etc.) [ 1 ]. However, the surface Fresnel reflection caused by refractive index mismatch at the interface between two different media, greatly impedes the transmission of light, and deteriorates the signal intensity and thermal imaging quality [ 2 , 3 ].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of an Anti-Reflective Microstructure on ZnS by Femtosecond Laser Bessel Beams

Liu

et al. 2021

Molecules

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As an important mid-infrared to far-infrared optical window, ZnS is extremely important to improve spectral transmission performance, especially in the military field. However, on account of the Fresnel reflection at the interface between the air and the high-strength substrate, surface optical loss occurs in the ZnS optical window. In this study, the concave antireflective sub-wavelength structures (ASS) on ZnS have been experimentally investigated to obtain high transmittance in the far-infrared spectral range from 6 μm to 10 μm. We proposed a simple method to fabricate microhole array ASS by femtosecond Bessel beam, which further increased the depth of the microholes and suppressed the thermal effects effectively, including the crack and recast layer of the microhole. The influence of different Gaussian and Bessel beam parameters on the microhole morphology were explored, and three ASS structures with different periods were prepared by the optimized Bessel parameters. Ultimately, the average transmittance of the sample with the ASS microhole array period of 2.6 μm increased by 4.1% in the 6 μm to 10 μm waveband, and the transmittance was increased by 5.7% at wavelength of 7.2 μm.

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Controlling the size and curvature radius of concave microlens array on fused silica by wet-etching-assisted with picosecond laser

Kong,

Sun,

Zhang

et al. 2024

Appl. Phys. A

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Broadband and wide-angle antireflective subwavelength microstructures on zinc sulfide fabricated by femtosecond laser parallel multi-beam

Cited by 31 publications

References 44 publications

Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

Review of Surface Modification Technologies for Mid‐Infrared Antireflection Microstructures Fabrication

Fabrication of an Anti-Reflective Microstructure on ZnS by Femtosecond Laser Bessel Beams

Controlling the size and curvature radius of concave microlens array on fused silica by wet-etching-assisted with picosecond laser

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