2010
DOI: 10.3109/09553001003789588
|View full text |Cite
|
Sign up to set email alerts
|

Brain DNA damage and 70-kDa heat shock protein expression in CD1 mice exposed to extremely low frequency magnetic fields

Abstract: These results indicate that in vivo ELF-MF induce reversible brain DNA damage while they do not elicit the stress response.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

2
18
0

Year Published

2011
2011
2022
2022

Publication Types

Select...
5
1

Relationship

1
5

Authors

Journals

citations
Cited by 16 publications
(20 citation statements)
references
References 63 publications
(81 reference statements)
2
18
0
Order By: Relevance
“…Neither primary DNA damage nor hsp70 induction was detected in any of the mouse pup brains collected after 7, 14 and 21 days of exposure (15 h/day) (Mariucci et al 2009). Unlike the mouse pups, the adult mice presented reversible DNA strand breaks and no increase in hsp70 expression following exposure to 1 mT ELF-MF for 1 or 7 days (15 h/day) (Mariucci et al 2010). Taken together, our results seemed to indicate that ELF-MF exposure -although causing cerebral DNA damage in an age-dependent way -does not infl uence hsp70 expression in mouse brain.…”
Section: Introductionmentioning
confidence: 52%
See 4 more Smart Citations
“…Neither primary DNA damage nor hsp70 induction was detected in any of the mouse pup brains collected after 7, 14 and 21 days of exposure (15 h/day) (Mariucci et al 2009). Unlike the mouse pups, the adult mice presented reversible DNA strand breaks and no increase in hsp70 expression following exposure to 1 mT ELF-MF for 1 or 7 days (15 h/day) (Mariucci et al 2010). Taken together, our results seemed to indicate that ELF-MF exposure -although causing cerebral DNA damage in an age-dependent way -does not infl uence hsp70 expression in mouse brain.…”
Section: Introductionmentioning
confidence: 52%
“…During sham-exposure (i.e., in the switched-off exposure system) magnetic fl ux density was 0.06 μ T. Th e design of the exposure system allowed MF uniformity higher than 97% in a volume of 20 ϫ 20 ϫ 10 cm. Other details regarding the exposure system have been described previously (Mariucci et al 2010). Th e exposure apparatus was placed in a temperature-controlled room at 22 ϩ 1 ° C.…”
Section: Exposure Systemmentioning
confidence: 99%
See 3 more Smart Citations