Boron compound protective coatings prepared by means of low pressure plasma CVD

Synchrotron-radiation-induced deposition of boron and boron carbide films from boranes and carboranes: Decaborane

“…In the absence of this high-energy radiation, decaborane (14) is observed to decompose only slowly and to only a very small coverage as seen in Fig. 2.…”

“…Adsorbed species readily desorb in vacuo ( < l0 -9 Torr at a substrate temperature between 300-475 K) leaving the surface free of boron as determined by subsequent Auger electron spectroscopy. 40 From photoemission spectra taken from the surface following exposure to decaborane (14) at 100 K, as seen in Fig. 3, we conclude that the initial adsorption of decaborane is largely molecular.…”

“…3 5 The vapor pressure can be raised readily by heating the decaborane, since the molecule decomposes only above 170 C. 3 6 The vapor pressure of decaborane (14) is given by The deposition experiments were carried out in a white light beam line previously described 3 4 at the Synchrotron Radiation Center in Stoughton, Wisconsin. Briefly, the broad band synchrotron radiation, with 545 eV critical energy, was focused on the sample with a fluence of 5 X 1013 photons/s --mA -1 mm -2.…”

“…Decaborane (14), B 10 H 14 , is an air-stable white crystalline solid with a vapor pressure of several Torr at room temperature. 3 5 The vapor pressure can be raised readily by heating the decaborane, since the molecule decomposes only above 170 C. 3 6 The vapor pressure of decaborane (14) is given by The deposition experiments were carried out in a white light beam line previously described 3 4 at the Synchrotron Radiation Center in Stoughton, Wisconsin.…”

“…8 Recently,6-2 decaborane ( 14) has been shown to be a suitable boron source for the chemical vapor deposition of boron films and an alternative to diborane (6) 3 2 We have explored the synchrotron-radiation-induced deposition of boron and boron carbide thin films from single-source compounds because of the great potential of x rays for very highresolution selective area processing. 3 3 ' 3 4 Boranes and carboranes are potential single-source compounds for the deposition of boron and boron carbides containing no impurities other than hydrogen and thus producing films whose stoichiometry is insensitive to the precise decomposition pathway.…”