Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering

Leng, Y.X.; Sun, Hongqi; Yang, Ping; Chen, J.Y; Wang, J; Wan, Guojiang; Huang, Nan; Tian, Xiubo; Wang, L.P; Chu, Paul K.

doi:10.1016/s0040-6090(01)01448-1

Cited by 120 publications

(49 citation statements)

References 7 publications

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“…Blood compatibility investigation reveals that the Ti-O/Ti-N duplex coatings are better than LTIC. In addition, tantalum nitride films with excellent mechanical and biomedical properties have been synthesized using a similar method [226]. Chen et al prepare tantalum doped Ti-O/Ti-N and obtain good mechanical property and blood compatibility results [227].…”

Section: Inorganic Blood Contacting Materialsmentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,407

652

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Plasma-surface modification (PSM) is an effective and economical surface treatment technique for many materials and of growing interests in biomedical engineering. This article reviews the various common plasma techniques and experimental methods as applied to biomedical materials research, such as plasma sputtering and etching, plasma implantation, plasma deposition, plasma polymerization, laser plasma deposition, plasma spraying, and so on. The unique advantage of plasma modification is that the surface properties and biocompatibility can be enhanced selectively while the bulk attributes of the materials remain unchanged. Existing materials can, thus, be used and needs for new classes of materials may be obviated thereby shortening the time to develop novel and better biomedical devices. Recent work has spurred a number of very interesting applications in the biomedical field. This review article concentrates upon the current status of these techniques, new applications, and achievements pertaining to biomedical materials research. Examples described include hard tissue replacements, blood contacting prostheses, ophthalmic devices, and other products. #

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Section: Inorganic Blood Contacting Materialsmentioning

confidence: 99%

Plasma-surface modification of biomaterials

Chu

Chen

Wang

et al. 2002

Materials Science and Engineering: R: Reports

1,407

652

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“…Ta-N coatings that are deposited via magnetron sputtering result in a variety of compound solutions, such as body centered cubic (bcc) TaN, hexagonal (hex) TaN, hex Ta 2 N, face centered cubic (fcc) TaN, hex Ta 5 N 6 , tetragonal Ta 4 N 5 , and orthorhombic (orth) Ta 6 N 2.5 , Ta 4 N, Ta 3 N 5 with differing physical, chemical, and mechanical properties [11][12][13][14][15][16][17][18]. The reported values of hardness for various phases of Ta-N thin films, such as hex Ta 2 N, fcc TaN, orth Ta 6 N 2.5 and orth Ta 4 N are 31, 20, 30.8, and 61.8 GPa, respectively [19][20][21][22][23][24][25].…”

Section: Introductionmentioning

confidence: 99%

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering

Zaman

Meletis

2017

Coatings

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Abstract:Reactive magnetron sputtering was used to deposit tantalum nitride (Ta-N) thin films on Si substrate. The effect of varying the N 2 percentage in the N 2 /Ar gas mixture on the Ta-N film characteristics was investigated. Mechanical and tribological properties were studied using nanoindentation and pin-on-disc wear testing. Decreasing the N 2 content in the gas mixture was found to change the film structure from face centered cubic (fcc) TaN (from 25% to 10% N 2 ) to highly textured fcc TaN (at 7% N 2 ) to a mixture of fcc TaN 1.13 and hexagonal Ta 2 N (at 5% N 2 ), and finally to hexagonal Ta 2 N (at 3% N 2 ). A high hardness of about 33 GPa was shown by the films containing the hexagonal Ta 2 N phase (5% and 3% N 2 ). Decreasing the N 2 content below 7% N 2 was also found to result in microstructural refinement with grain size 5-15 nm. Besides the highest hardness, the film deposited with 3% N 2 content exhibited the highest hardness/modulus ratio (0.13), and elastic recovery (68%), and very low wear rate (3.1 × 10 −6 mm 3 ·N −1 ·m −1 ).

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“…Several reports have appeared in the last few years about the preparation and characterization of tantalum nitride thin films [1,[18][19][20][21][22][23][24]. Tantalum nitride has recently been attracted considerable attention due to its special properties such as good adhesion to dielectrics and high thermal stability [25][26][27], stable electrical * Author for correspondence (ramezani.1972@gmail.com) resistance [28], chemical inertness and high mechanical hardness [29,30].…”

Section: Introductionmentioning

confidence: 99%

Structural modification of tantalum crystal induced by nitrogen ion implantation

et al. 2016

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This paper investigates the effect of nitrogen ion implantation on tantalum surface structure. In this experiment, nitrogen ions which had an energy of 30 keV and doses of 1 × 10 17 to 10 × 10 17 ions cm −2 were used. X-ray diffraction analysis (XRD) was applied for both the metallic Ta substrate and the study of new structures that have been created through the nitrogen ion implantation. Atomic force microscopy (AFM) was also used to check the roughness variations prior to and also after the implantation phase. The experimental results show the formation of hexagonal tantalum nitride (TaN 0.43 ) in addition to the fact that by increasing the ion dose, the nitrogen atoms occupy more interstitial spaces in the target crystal. The nitride phase also seen for 3 × 10 17 and 5 × 10 17 ions cm −2 , while it disappeared for higher dose of 7 × 10 17 and 1 × 10 18 ions cm −2 . The FWHM of the dominant peak of tantalum nitride suggest the growth of the crystallite's size, which is in agreement with the AFM results of the grains.

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Biomedical properties of tantalum nitride films synthesized by reactive magnetron sputtering

Cited by 120 publications

References 7 publications

Plasma-surface modification of biomaterials

Plasma-surface modification of biomaterials

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering

Structural modification of tantalum crystal induced by nitrogen ion implantation

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