“…The experimental set-up used for the nitinol thin film deposition was already described elsewhere [20,21]. Briefly, two high purity Ni and Ti disks (99.99%) were placed on a multi-target system and irradiated at 458 by a frequency tripled Nd:YAG pulsed laser (l = 355 nm, 5 ns) operating in vacuum (10 À6 mbar), a fluence of 4 J/cm 2 and a repetition rate of 5 Hz.…”