1997
DOI: 10.1103/physrevb.55.4376
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Binding energy of the free exciton in indium arsenide

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Cited by 15 publications
(8 citation statements)
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“…In the case of exciton recombination, it is instead lower than the bandgap energy by the free exciton binding energy, which should not differ much from that of the free exciton in bulk ZB InAs (1 meV). 42 However, in the case of InAs, native surface defects can pin the Fermi level above the conduction band edge, 43 thus giving rise to a surface accumulation layer and to a native n-doping. In the latter case, a fit would be required in order to determine precisely the bandgap energy, which is impeded here by the large, Gaussian broadening of the 477 meV band.…”
Section: Nano Lettersmentioning
confidence: 99%
“…In the case of exciton recombination, it is instead lower than the bandgap energy by the free exciton binding energy, which should not differ much from that of the free exciton in bulk ZB InAs (1 meV). 42 However, in the case of InAs, native surface defects can pin the Fermi level above the conduction band edge, 43 thus giving rise to a surface accumulation layer and to a native n-doping. In the latter case, a fit would be required in order to determine precisely the bandgap energy, which is impeded here by the large, Gaussian broadening of the 477 meV band.…”
Section: Nano Lettersmentioning
confidence: 99%
“…Using the parameters given in Table 2, we thus obtain E b = 2 meV. This value does not differ from that of the free exciton in bulk ZB InAs (1 meV) [44]. Moreover, the exciton binding energy is in the 5-25 meV range for SK InAs/InP QDs [45,46].…”
Section: Resultsmentioning
confidence: 62%
“…The lower activation energy is associated to carrier recombination through defects in the quantum structures or their interfaces while the higher activation energy is compatible with the unipolar escape of carriers from the nanostructures to the matrix [43]. If we assume an isotropic dielectric constant, the WZ InAs exciton binding energy can be estimated using the following equation: (7) where ε(0) is the dielectric constant (15.15 for ZB InAs [44]), m e and m A are the electron and A-band hole effective masses that takes in account the existing anisotropy in the WZ InAs effective masses. Using the parameters given in Table 2, we thus obtain E b = 2 meV.…”
Section: Resultsmentioning
confidence: 99%
“…29,30 Indeed, during ion implantation, pairs of interstitial-vacancies are created due to cascades, the so-called IV pairs. Tight-binding MD simulations of Tang et al 31 report that under a certain condition, the IV-pair creates a metastable defect structure with an annihilation energy of 1.1 eV. Cargnoni et al 32 further confirm the energy barrier and also that IV-pair defect and the bond defect are closely related.…”
Section: The Amorphous Structurementioning
confidence: 93%