2019
DOI: 10.1039/c9ra02105a
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Bimetallic phosphide decorated Mo–BiVO4 for significantly improved photoelectrochemical activity and stability

Abstract: Bimetallic phosphide NiCoP decorated Mo–BiVO4 photoanode was fabricated, and showed significantly improved photoelectrochemical activity and stability.

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Cited by 18 publications
(13 citation statements)
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“…The 1/2 and 3/2 spin‐orbit doublet components of the V 5+ of the same electrode are located at 523.7 eV and 516.25 eV, respectively (see Figure d) . After the deposition of Au nanoislands, the V 2p and Bi 4f peaks are slightly blue shifted (≈0.1 eV) compared with the bare BiVO 4 , suggesting an electron transfer from Au to BiVO 4 , which could be attributed to the relatively high electronegativity of Au (see Figure c,d) . Moreover, the characteristics peaks at 87.18 eV and 83.5 eV in Figure S2 (in the Supporting Information) are ascribed to Au 4f 5/2 and Au 4f 7/2 , respectively, for Au‐BiVO 4 .…”
Section: Resultsmentioning
confidence: 94%
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“…The 1/2 and 3/2 spin‐orbit doublet components of the V 5+ of the same electrode are located at 523.7 eV and 516.25 eV, respectively (see Figure d) . After the deposition of Au nanoislands, the V 2p and Bi 4f peaks are slightly blue shifted (≈0.1 eV) compared with the bare BiVO 4 , suggesting an electron transfer from Au to BiVO 4 , which could be attributed to the relatively high electronegativity of Au (see Figure c,d) . Moreover, the characteristics peaks at 87.18 eV and 83.5 eV in Figure S2 (in the Supporting Information) are ascribed to Au 4f 5/2 and Au 4f 7/2 , respectively, for Au‐BiVO 4 .…”
Section: Resultsmentioning
confidence: 94%
“…The two strong peaks at 164.03 eV and 158.73 eV with the orbital splitting of 5.3 eV, corresponding to Bi 4f 5/2 and Bi 4f 7/2 , are the characteristics of Bi 3+ species for the as‐prepared BiVO 4 film . The 1/2 and 3/2 spin‐orbit doublet components of the V 5+ of the same electrode are located at 523.7 eV and 516.25 eV, respectively (see Figure d) . After the deposition of Au nanoislands, the V 2p and Bi 4f peaks are slightly blue shifted (≈0.1 eV) compared with the bare BiVO 4 , suggesting an electron transfer from Au to BiVO 4 , which could be attributed to the relatively high electronegativity of Au (see Figure c,d) .…”
Section: Resultsmentioning
confidence: 94%
“…[51,52] The 1/2 and 3/2 spin-orbit doublet componentso f the V 5 + of the same electrode are located at 523.7 eV and 516.25 eV,r espectively (see Figure 2d). [53,54] After the deposition of Au nanoislands,t he V2pa nd Bi 4f peaks are slightly blue shifted ( % 0.1 eV) compared with the bare BiVO 4 ,s uggesting an electron transfer from Au to BiVO 4 ,w hichc ould be attributedt ot he relativelyh igh electronegativity of Au (see Figure 2c,d). [54][55][56][57] Moreover,t he characteristics peaks at 87.18 eV and 83.5 eV in Figure S2 (in the Supporting Information) are ascribed to Au 4f 5/2 and Au 4f 7/2 ,r espectively, [58] for Au-BiVO 4 .T he XPS measurements are not only used to providei nformation about the surface compositiono ft he sample, buti tc an also be employed to study the surface properties of the layer and the electronicb and structure of the design.F or the investigation of the existence of surface defects, the O1ss pectra of the samples were analyzed.T he core-level O1ss pectrumo fa s-prepared BiVO 4 is deconvoluted into three Gaussian peaks, as explained in our previous study.…”
Section: Resultsmentioning
confidence: 98%
“…BiVO 4 possesses a bandgap of 2.4 eV, while its valence band (VB) is positioned positively enough to facilitate the OER. Nevertheless, the performance of BiVO 4 is limited by poor charge carrier transportation and slow surface reaction kinetics that impedes it from reaching its theoretical photocurrent density of 7.6 mA cm –2 under AM 1.5G illumination. , The fabrication process of the electrode involves the growth of ZIF-67 on a BiVO 4 surface by a coordination-assisted solvothermal process (Figure a). As a part of this method, the semiconductor is initially decorated with functional groups to direct the growth of MOF particles on the surface.…”
Section: Introductionmentioning
confidence: 99%