Berufsschul-Religionslehrerausbildung in Darmstadt

38.2: Deposition of Highly Conductive ITO Thin Films for Display Applications with the rf/dc Process

“…6 gives the total energy impact onto the substrate. It could be shown, that this value increases linearly with increasing RF-portion of the total power [6]. The ion current deposits energy in the film surface and this improves the mobility of the atoms of the growing film and leads therefore to a different film structure [7].…”