Barrier and mechanical properties of carbon steel coated with SiOx/SiOxCyHz gradual films prepared by PECVD

Rangel, Rita C.C.; Cruz, Nilson Cristino da; Milella, Antonella; Fracassi, Francesco; Rangel, Elidiane Cipriano

doi:10.1016/j.surfcoat.2019.124996

Cited by 16 publications

(15 citation statements)

References 29 publications

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“…As can be noticed, the results of surface morphology consistently explain those of roughness although both have been obtained from samples prepared on different substrates (glass and Al). This fact suggests that similar films may be obtained on substrates with different chemical natures (metallicglassy) and electrical properties (dielectric-conductive), as already verified in previous works 24,25 .…”

Section: Resultssupporting

confidence: 84%

“…In this scale it is observed that film does not completely hide the defects of the substrate. However, in all cases it is identified the presence of a film with granular structure typically observed in films deposited from HMDSO by PECVD [24][25][26] . Variations in O 2 % produce a gradual change in the film's topography which is smoothened for oxygen additions of up to 40%, but becomes rougher when 50% of O 2 is admitted.…”

Section: Resultsmentioning

confidence: 83%

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SiOxCyHz-TiO2 Nanocomposite Films Prepared by a Novel PECVD-Sputtering Process

et al. 2021

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Recently, there has been growing interest in the incorporation of particles in plasma deposited thin films to creation of multifunctional surfaces. In this work a new hybrid methodology based on the plasma enhanced chemical vapor deposition (PECVD) of hexamethyldisiloxane combined to the reactive sputtering of TiO 2 is proposed for the preparation of SiO x C y H z -TiO 2 composite films. Specifically, the effect of the proportion of O 2 in the plasma environment on the morphology, chemical structure, elemental composition, wettability, thickness and surface roughness, of the films was studied. Agglomerates of TiO 2 (16-83 μm) were detected into the organosilicon matrix with the concentration of particulates growing with the percentage of oxygen in the feed. In general, there was elevation in the angle of contact of the surfaces as the oxygen supply increased. Interpretation is proposed in terms of the influence of the oxygen supply on the TiO 2 sputtering rate and in the oxidation of plasma species.

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Section: Resultssupporting

confidence: 84%

Section: Resultsmentioning

confidence: 83%

SiOxCyHz-TiO2 Nanocomposite Films Prepared by a Novel PECVD-Sputtering Process

et al. 2021

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“…The plasma deposited SiOx thin films from organosilicon precursors manifest an attractive approach to enhancement of the corrosion resistance of carbon steel. The deposited SiOx films showed excellent stability, flexibility, and smoothness [1].…”

Section: Introductionmentioning

confidence: 99%

“…Almost metals, particularly carbon steel, are thermodynamically unstable therefore, they corrode especially when they are in contact with oxygen and water. Moreover, the corrosion destroys millions of tons of carbon steel over the world per year [1,2].Over the years, numerous numbers of studies that concerned with different methods for the protection of metals against corrosion to provide wide utilization of these metals. An effective way to retard corrosion of carbon steel by coating its surfaces with thin films which act as barriers against corrosion [3][4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

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Plasma Power Impact on Electrochemical Performance of Low Carbon Steel Coated by Plasma Thin Teos Films

Gangan¹,

ElSabbagh²,

Bedair³

et al. 2020

Al-Azhar Bulletin of Science

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Electrochemical properties of thin silicon oxy carbide films were investigated as anticorrosive coatings. The film was deposited on low carbon steel substrate by radio frequency capacitive coupled plasma technique using tetraethyl ortho silicate (TEOS) as a precursor and Ar was used as a carrier gas in dependence on the applied power. The chemical composition and morphological of the deposited films were examined by energydispersive X-ray spectroscopy (EDX) coupled with scanning electron microscopy (SEM). The SEM results confirm a pinhole-free layer of oxy carbide was formed on the steel surface after plasma treatment. The corrosion resistance of the coatings was analyzed by potentiodynamic polarization and electrochemical spectroscopy (EIS) in 3.5% NaCl solution at room temperature. The electrochemical results show remarkable corrosion resistance enhancement after plasma treatments. The corrosion current (icorr) is significantly reduced from 12 µA/cm 2 for the blank sample to 1 and 0.3 µA/cm 2 for treated samples at 50, and 100 W, respectively. A marked increase of the protective properties was detected by 100 W sample with protective efficiency more than 98 % at room temperature.

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