2018
DOI: 10.1063/1.5046827
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Bandlike and localized states of extended defects in n-type In0.53Ga0.47As

Abstract: In 0.53 Ga 0.47 As p + n diodes with different densities of extended defects have been analyzed by detailed structural and electrical characterization. The defects have been introduced during Metal-Organic Vapor Phase Epitaxy (MOVPE) growth by using a lattice-mismatched layer on a semi-insulating InP or GaAs substrate. The residual strain and indium content in the n-type In 0.53 Ga 0.47 As layer have been determined by high-resolution X-ray diffraction, showing nearly zero strain and a fixed indium ratio of 0.… Show more

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Cited by 12 publications
(66 citation statements)
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“…In the AFM image, many cross‐hatch lines in the [1‐10] direction originating from α MD can be observed in Figure b–d, and additional defects called micro‐crack (dark grooves in [110] direction in Figure c) are recognized in sample P_In40 only. A detailed interpretation can be found in the study by Hsu et al Although the AFM image fairly reveals the defects by morphology variation, by selecting a relative flat region (the square region in Figure d,e), ECCI could further distinguish more defects from dark or bright contrast straight lines in the [1‐10] direction. These kinds of defects that are neither visualized by AFM nor originating from surface roughness have the same origin as α MD, as discussed later.…”
Section: Resultsmentioning
confidence: 83%
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“…In the AFM image, many cross‐hatch lines in the [1‐10] direction originating from α MD can be observed in Figure b–d, and additional defects called micro‐crack (dark grooves in [110] direction in Figure c) are recognized in sample P_In40 only. A detailed interpretation can be found in the study by Hsu et al Although the AFM image fairly reveals the defects by morphology variation, by selecting a relative flat region (the square region in Figure d,e), ECCI could further distinguish more defects from dark or bright contrast straight lines in the [1‐10] direction. These kinds of defects that are neither visualized by AFM nor originating from surface roughness have the same origin as α MD, as discussed later.…”
Section: Resultsmentioning
confidence: 83%
“…These eight systems are listed in Table . Because the gliding mobility of α MD is much larger than for β MD, α MD tends to elongate faster and then blocks β MD, resulting in a preferred [1‐10] anisotropic morphology and asymmetric relaxation originating from α MD in the tensile In x Ga 1− x As/InP system . If performing ECCI on this preferred α MD (between Figure a,b and Figure 3d,e), it should be always visible, because g b never equals zero for both g = (220) and g = (2‐20) diffraction directions.…”
Section: Discussionmentioning
confidence: 99%
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