2014
DOI: 10.1103/physrevb.90.075203
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Band gap renormalization and Burstein-Moss effect in silicon- and germanium-doped wurtzite GaN up to1020 cm3

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Cited by 147 publications
(93 citation statements)
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“…This feature could be used to tune the transparency of GaN in the 1-7 µm spectral range. In general, the free carrier absorption is a well-known phenomenon in semiconductors which has been also observed for n-type GaN [13][14][15][20][21][22]. In order to compare our experimental results Figure 3a shows transmission spectra measured at room temperature for GaN crystals doped by oxygen with various concentrations of free electrons.…”
Section: Resultsmentioning
confidence: 72%
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“…This feature could be used to tune the transparency of GaN in the 1-7 µm spectral range. In general, the free carrier absorption is a well-known phenomenon in semiconductors which has been also observed for n-type GaN [13][14][15][20][21][22]. In order to compare our experimental results Figure 3a shows transmission spectra measured at room temperature for GaN crystals doped by oxygen with various concentrations of free electrons.…”
Section: Resultsmentioning
confidence: 72%
“…In general, the free carrier absorption is a well-known phenomenon in semiconductors which has been also observed for n-type GaN [13][14][15][20][21][22]. In order to compare our experimental results In general, the free carrier absorption is a well-known phenomenon in semiconductors which has been also observed for n-type GaN [13][14][15][20][21][22]. In order to compare our experimental results with a quantitative analysis, the plasma frequency (ω P ) has been calculated for various carrier concentrations according to Equation (2)…”
Section: Resultsmentioning
confidence: 91%
“…It has been successfully used to produce films with free electron concentration higher than 10 19 cm À 3 . However, a considerable modification of the fundamental material parameters is often observed in heavily doped films [4,5]. Further improvements in high performance of GaN-based devices call hence for an accurate and systematic understanding of basic physical modification undergone by the material due to doping.…”
Section: Introductionmentioning
confidence: 99%
“…GaN is the object of an increasing interest in the last few years owing to its potential applications in electronic and optoelectronic fields [1][2][3][4]. For the design and realization of GaN-based devices, high carrier concentration with a controlled and reproducible n-or p-type doping is needed [4].…”
Section: Introductionmentioning
confidence: 99%
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