2019
DOI: 10.1088/1361-6463/ab18e0
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Band alignments of β-Ga2O3 with MgO, Al2O3 and MgAl2O4 measured by x-ray photoelectron spectroscopy

Abstract: High-k and wide bandgap materials are necessary to work as gate dielectrics and surface passivation layers in β-phase gallium oxide (β-Ga 2 O 3 ) based metal-oxide-semiconductor (MOS) devices. The band offsets between these materials and β-Ga 2 O 3 play an important role in the properties of the devices. In this work, we grew β-Ga 2 O 3 thin films on MgO, sapphire and MgAl 2 O 4 single crystal substrates by the radio-frequency magnetron sputtering method, and used x-ray photoelectron spectroscopy to measure th… Show more

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Cited by 34 publications
(18 citation statements)
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“…The magnitude of these offsets is similar to those of established dielectrics such as SiO2, Al2O3, HfO2 or HfSiO4 to various other polymorphs of the (AlxGa1-x)2O3/(InxGa1x)2O3 alloy systems [60][61][62] . Therefore, this material might be a promising alternative to these established gate dielectrics in HEMT or other field-effect transistor applications based on Ga2O3, as also recently suggested for the monoclinic modification 63 . The valence band offsets are comparably small and no correlation could be found between the offset magnitude and the Al or In content.…”
Section: Discussionmentioning
confidence: 80%
“…The magnitude of these offsets is similar to those of established dielectrics such as SiO2, Al2O3, HfO2 or HfSiO4 to various other polymorphs of the (AlxGa1-x)2O3/(InxGa1x)2O3 alloy systems [60][61][62] . Therefore, this material might be a promising alternative to these established gate dielectrics in HEMT or other field-effect transistor applications based on Ga2O3, as also recently suggested for the monoclinic modification 63 . The valence band offsets are comparably small and no correlation could be found between the offset magnitude and the Al or In content.…”
Section: Discussionmentioning
confidence: 80%
“…Due to the heterojunction fabrication for the first time, for confirming the thin‐film quality, we deposited them for a long time, which may damage the thin‐film surface and/or interface. With the magnetron sputtering system in our lab, the growing temperature of 750 °C is preferable to achieve better quality gallium oxide films . However, the long‐time sputtering could facilitate better crystal and its interface quality at low temperature .…”
Section: Resultsmentioning
confidence: 99%
“…The valves of core energy levels for the Ga 2 O 3 and the Sr 3 Al 2 O 6 are 134 and 1118.49 eV at the Sr 3 Al 2 O 6 /Ga 2 O 3 (SAO/GAO) heterointerface, respectively. Then, the ΔEnormalC and ΔEnormalV can be calculated using the following equationsΔEnormalV=(EcoreEVBM)GAO(EcoreEVBM)SAO(EcoreGAOEcoreSAO)GAOSAOi.e., ΔEV=(1118.591.8)(133.461.69)(1118.49134)=0.53 eV…”
Section: Resultsmentioning
confidence: 99%
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“…To design an effective unipolar barrier APD device, both interfacial lattice compatibility and energy band offsets need careful consideration. By taking account of our previous experimental results 28 (Supplementary Fig. S1), MgO was incorporated with Ga 2 O 3 to form a unipolar barrier structure possessing a large conduction band offset ΔE C and nearly zero valance band offset ΔE V .…”
Section: Device Fabrication and Characterization Of Epitaxial Heteros...mentioning
confidence: 99%