2016
DOI: 10.1021/acsami.6b07421
|View full text |Cite
|
Sign up to set email alerts
|

Band Alignment for Rectification and Tunneling Effects in Al2O3 Atomic-Layer-Deposited on Back Contact for CdTe Solar Cell

Abstract: The present work intends to explain why ultrathin AlO atomic-layer-deposited (ALD) on the back contact with rectification and tunneling effects can significantly improve the performance of CdTe solar cells in our previous work [ Liang , J. ; et al. Appl. Phys. Lett. 2015 , 107 , 013907 ]. Herein, we further study the mechanism through establishing the interfacial energy band diagram configuration of the ALD AlO/CuTe by experiment of X-ray photoelectron spectroscopy and first-principles calculations and conclud… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

1
3
0

Year Published

2018
2018
2023
2023

Publication Types

Select...
7

Relationship

2
5

Authors

Journals

citations
Cited by 8 publications
(4 citation statements)
references
References 38 publications
1
3
0
Order By: Relevance
“…For the interface energy band measurement by the XPS, first a 100 nm CdS film was sputtered on the TiO 2 or NTO surface, after annealed at 400 • C for 20 min, the CdS film was etched away by Ar + on the XPS instrument so that the trace of Ti 2p and Cd 3d can be simultaneously got, which is consistent with the literatures [35,36]. To calculate the energy band structure of their interface in the figures 3(g)-(i), the valence band offset (∆E V ) were calculated first by formula 1, 2 below [39,40].…”
Section: Resultssupporting
confidence: 59%
“…For the interface energy band measurement by the XPS, first a 100 nm CdS film was sputtered on the TiO 2 or NTO surface, after annealed at 400 • C for 20 min, the CdS film was etched away by Ar + on the XPS instrument so that the trace of Ti 2p and Cd 3d can be simultaneously got, which is consistent with the literatures [35,36]. To calculate the energy band structure of their interface in the figures 3(g)-(i), the valence band offset (∆E V ) were calculated first by formula 1, 2 below [39,40].…”
Section: Resultssupporting
confidence: 59%
“…There is also the question of whether copper is used in the process, so the interface in some studies can be to other materials (eg, CdTe/Cu x Te/Al 2 O 3 175 ), rather than directly depositing Al 2 O 3 onto CdTe. Atomic layer deposited (ALD) Al 2 O 3 on TEC™ 10 substrates has also been used to overcome shorts due to pinholes in CdTe solar cells (TEC™ 10/Al 2 O 3 /CdS/CdTe/ZnTe:Cu/Ni).…”
Section: Aluminum Oxidementioning
confidence: 99%
“…In addition, the composition and microstructure of the heterointerface can be controlled at the atomic level, which is of great importance to obtain a fundamental understanding about the contribution of heterointerfaces to electrocatalytic activities. There have been great progresses recently in developing ALD processes for various transition metal oxides [32,33,34,35,36,37,38,39,40,41,42] and sulfides [30,31,43,44,45,46,47,48,49,50]. Xiong et al [46] designed and constructed a hybrid compound Fe x Co 1Àx S y electrocatalyst with controllable composition on a complex 3D structure (carbon nanotubes on carbon cloths) for HER by ALD.…”
Section: Introductionmentioning
confidence: 99%