Balanced magnetic field in magnetron sputtering systems

Oxidation kinetics of Cr-coated zirconium alloy: Effect of coating thickness and microstructure

“…Chromium targets (∅ 90 mm and thickness of 8 mm; JSC Polema, Russia) with purity of 99.95 % were used. The 4.5 μm thick Cr coating with dense microstructure was obtained by the multi cathode magnetron sputtering system with "closed" [18,28,29] magnetic field and direct current (DC) power supply (Applied Electronics LLC, Russia). The high rate deposition of columnar Cr coatings (thickness of 6 and Note: Qtarget power density; tdeposition time; U bbias potential; j sion current density on a substrate; hcoating thickness; T subsubstrate temperature.…”

Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering

“…Films were deposited by reactive direct-current magnetron sputtering (R-DCMS) in a cylindrical high-vacuum (cryo-pumped) chamber, 36 cm in height and 44 cm in diameter with a base pressure of ∼5 × 10 −7 Torr. The substrate and chamber walls were maintained at a base temperature of ∼ 30 • C. Deposition was conducted using a 76 mm diameter planar magnetron gun (MAK series from MeiVac inc.) with a geometrical unbalance coefficient of ∼1.2 [20].…”

Magnetron Sputtering High-Entropy Alloy Coatings: A Mini-Review

“…In contrast, only a few magnetic field lines are closed between the inner and outer poles in an unbalanced MS magnetic system. The unclosed magnetic field lines are radially directed towards the walls of the sputtering chamber [22]. The magnetic fields in balanced and unbalanced MS are schematized in Figure 2.…”

“…The magnetic fields in balanced and unbalanced MS are schematized in Figure 2. Reproduced with permission from [22]. Copyright 2016, Elsevier.…”

“…The stoichiometry of HEA thin films was Al 10 Si 19 Ta 44 Ti 11 Zr 16 , with a thickness of 2.2 µm and had an amorphous structure. Reproduced with permission from [22]. Copyright 2016, Elsevier.…”