The enthalpies and entropies of activation of CF3 radical addition to a series of substrates possessing the CH 4 reaction centre were determined in the gas phase between 65 and 180°C.The addition process, >C=CHz+CF, -z \ * C-CH2CF3, (2), competes for CF3 radicals with the / hydrogen abstraction, RH+ CF3 +Re+ CFJH, (l), RH denoting 2,3-dimethyl butane. The radicals were formed by photolysis of CF3NN. CF3. The system was found free of any side reactions. The following substrates were investigated : vinyl fluoride, vinyl chloride, ethylene, propylene, isobutene, styrene, a-methyl styrene, 1,3-butadiene, isoprene and 2,3-dimethyl-l,3-butadiene.The reactivities, measured by k2/kl at 65"C, increase 200-fold when the least reactive vinyl fluoride is compared with the most reactive 2,3-dimethyl butadiene-1,3. This increase is due to a decrease in the activation energies, -A E = (&-El) whereas the A2/A1 factors remained essentially constant. Good agreement was found between these A2/A1 values and those found in the addition of CH3 radicals to the same series of substrates.In the present investigations it was intended (i) to determine the activation energies, E2-& and the temperature independent factors, A2/A1, for CF3 addition to a series of substrates possessing the same reactive centre ; and (ii) to compare the activation 553 CF3 + substrate+CF3 . substrate. k2, CF3+HS+CF3H+S* , kl,