Automation for pattern library creation and in-design optimization

Deng, Rock; Zou, Elain; Hong, Sid; Wang, Jinyan; Zhang, Yifan; Sweis, Jason; Lai, Yuen-Liang; Ding, Hua; Huang, Jian

doi:10.1117/12.2087100

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2016

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“…The interesting design patterns are extracted from the previous layout and placed in a pattern library 6 . The pattern analysis proceeds from two aspects.…”

Section: Dtco Diagrammentioning

confidence: 99%

Design technology co-optimization for 14/10nm metal1 double patterning layer

Duan¹,

Su²,

Chen³

et al. 2016

SPIE Proceedings

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Design and technology co-optimization (DTCO) can satisfy the needs of the design, generate robust design rule, and avoid unfriendly patterns at the early stage of design to ensure a high level of manufacturability of the product by the technical capability of the present process. The DTCO methodology in this paper includes design rule translation, layout analysis, model validation, hotspots classification and design rule optimization mainly. The correlation of the DTCO and double patterning (DPT) can optimize the related design rule and generate friendlier layout which meets the requirement of the 14/10nm technology node. The experiment demonstrates the methodology of DPT-compliant DTCO which is applied to a metal1 layer from the 14/10nm node. The DTCO workflow proposed in our job is an efficient solution for optimizing the design rules for 14/10 nm tech node Metal1 layer. And the paper also discussed and did the verification about how to tune the design rule of the U-shape and L-shape structures in a DPT-aware metal layer.

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“…The interesting design patterns are extracted from the previous layout and placed in a pattern library 6 . The pattern analysis proceeds from two aspects.…”

Section: Dtco Diagrammentioning

confidence: 99%