2012
DOI: 10.48550/arxiv.1208.4216
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Augmenting the spin properties of shallow implanted NV-centers by CVD-overgrowth

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“…For example by decreasing the implantation energy to about 10 keV and using the present mask technology should allow for a pair creation efficiency of almost 100 %. Recently techniques like nano implantation with positioning accuracies of 20 nm 23,31 and shallow implanted defect showing dephasing times not degenerated by surface proximity [32][33][34] have improved considerably. With the aid of those techniques controlled generation of large scale arrays seem to be within reach, paving the way towards room temperature quantum devices.…”
Section: Entanglement Is the Central Yet Fleeting Phenomena Of Quantu...mentioning
confidence: 99%
“…For example by decreasing the implantation energy to about 10 keV and using the present mask technology should allow for a pair creation efficiency of almost 100 %. Recently techniques like nano implantation with positioning accuracies of 20 nm 23,31 and shallow implanted defect showing dephasing times not degenerated by surface proximity [32][33][34] have improved considerably. With the aid of those techniques controlled generation of large scale arrays seem to be within reach, paving the way towards room temperature quantum devices.…”
Section: Entanglement Is the Central Yet Fleeting Phenomena Of Quantu...mentioning
confidence: 99%
“…Figure 4 shows the values of T 2 for n-i-n junctions with various w i , along with the Hahn echo decay curve for w i = 1 µm, shown in the inset. The values of T 2 were approximately 9 µs, typical for an implanted ensemble of NV centers, 24,25) regardless of the value of w i . Therefore, T 2 was maintained while increasing the NV − ratio, demonstrating that the variation of w i had no effect on T 2 of the NV centers in the i-layer.…”
mentioning
confidence: 90%