Au Gratings Fabricated by Interference Lithography for Experimental Study of Localized and Propagating Surface Plasmons

Dan’ko, Viktor; Dmitruk, Mykola; Индутный, И. З.; Mamykin, S.V.; Mynko, V. I.; Shepeliavyi, P. E.; Lukaniuk, Mariia; Lytvyn, P. M.

doi:10.1186/s11671-017-1965-4

Cited by 9 publications

(17 citation statements)

References 16 publications

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“…But this weak dependence of the resonance spectral position is characteristic for the LP excitation in a periodic array of nanowires [6]. This result agrees with the previous measurements, where it was shown that only local plasmons are excited in the grating of isolated nanowires, when slits between nanowires are wider than the half-period of the grating nanowires are wider than the half-period of the grating [10]. At the same time, no extinction bands are observed in S-polarization at φ = 0.…”

Section: Resultssupporting

confidence: 92%

“…So, for large distances between nanowires the influence of LP-SPP interaction is not essential, and we observe only the LP peak. However, when the slit width between grating grooves decreases, the optical response of the grating may change [10]. Fig.…”

Section: Resultsmentioning

confidence: 99%

“…Optical properties of fabricated plasmonic structures were studied using measurements of spectral and angular dependences of transmission and reflection of polarized light. The automated setup for these measurements was described in more detail in the previous paper [10]. These measurements enable to plot the dispersion curves of excited optical modes and to identify their types.…”

Section: Methodsmentioning

confidence: 99%

“…Excitation of these modes is defined by system properties, and their interaction leads to redistribution of the oscillator strengths of the separate modes. Excitation of LP and SPP in gold gratings is well studied in literature (including gratings with different depths of modulation and/or slit width between grating grooves [6][7][8][9][10]).…”

Section: Introductionmentioning

confidence: 99%

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Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation

Dan’ko¹

2019

Semicond. phys., quantum electron. optoelectron.

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353 Optics Control of plasmons excitation by P-and S-polarized light in gold nanowire gratings by azimuthal angle variation V.A. Dan'ko, I.Z. Indutnyi, V.I. Myn'ko, S.V. Mamykin, P.Ye. Shepeliavyi, M.V. Lukaniuk, P.M. LytvynAbstract. We present results of experiments to determine the dispersion of the plasmon modes associated with Au nanowire gratings with a fixed spatial frequency (3370 mm -1 ) and different slits between the nanowires fabricated using an interference (interferometric) lithography technique. Optical properties of fabricated plasmonic structures were studied using measurements of spectral and angular dependence of P-and S-polarized extinction in the wavelength range 0.4…1.1 µm, angles of incidence 10…70 degrees in conical mounting (at variable azimuth angle within the range φ = 0…90 degrees). It has been shown that in the grating with the average slit between the nanowires equal to half of the grating period at φ = 0 only local plasmons (LP) are excited by P-polarized light. When the azimuth angle changes from 0 to 90°, the intensity of the excited LP is smoothly "transferred" from P-to S-polarized excitation, and at φ ~ 30…45 degrees the intensities of the LP bands in both polarizations are approximately equal. However, in the sample with narrow slits between the nanowires (40 nm) we observe the mixed mode with excitation both surface plasmon-polariton (SPP) and LP in the P-polarization at φ = 0. With φ rising, the intensity of the mixed mode in P-polarization decreases and simultaneously the LP mode intensity in S-polarization increases.

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Section: Resultssupporting

confidence: 92%

Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation

Dan’ko¹

2019

Semicond. phys., quantum electron. optoelectron.

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“…Amorphous AsSe based semiconductor chalcogenide glasses (ChG) have a number of properties that allow their applications as positive and negative optical and electronic resists as well as for direct relief formation due to photo-fluidity and mass-transport phenomena [25,26]. We have shown their unique sensitivity for localized plasmon fields and perspectives of plasmon-assisted nanolithography, a near-field nanoimaging [27] as well as to plasmonic structures productions [28]. Thus, using ChG as a nanolithography mask material provides opportunities for a combination of different types of lithographic patterning.…”

Section: Introductionmentioning

confidence: 99%

Features of mechanical scanning probe lithography on graphene oxide and As(Ge)Se chalcogenide resist

Lytvyn¹

2018

Semicond. Phys. Quantum Electron. Optoelectron.

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Combined mechanical scanning probe lithography (SPL) approach applied for the direct mask-less modification of graphene oxide (GO) flakes and the mask patterns engraving in layers of chalcogenide resist with a nanometer scale resolution have been implemented in this work. It was compared the dynamics of mechanical modification of chalcogenide films and multilayer GO flakes deposited from an aqueous suspension. The double-layer As 40 Se 60 /As 4 Ge 30 S 66 chalcogenide resist developed for mechanical SPL and pattern formation processes have optimized. The resist with the thickness close to 100 nm provides formation of minimal pattern elements with the size of several tens nanometers. The SPL approach was realized on the basis of serial NanoScope IIIa Dimension 3000 TM scanning probe microscope, and original software utilities were developed. These mechanical SPL could be intended for the verification of innovative ideas in academic researches, the laboratory-level device prototyping, developing the functional prototypes of new devices in bio/nanosensorics, plasmonics, 2D electronics and other modern technology branches.

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Self-Organized Nanogratings for Large-Area Surface Plasmon Polariton Excitation and Surface-Enhanced Raman Spectroscopy Sensing

Barelli

Giòrdano

Gucciardi

et al. 2020

ACS Appl. Nano Mater.

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Surface Plasmon Polaritons (SPP) are exploited due to their intriguing properties for photonic 2 circuits fabrication and miniaturization, for surface enhanced spectroscopies and imaging beyond the diffraction limit. However, the excitation of these plasmonic modes by direct illumination is forbidden by energy/momentum conservation rules. One strategy to overcome this limitation relies on diffraction gratings to match the wavevector of the incoming photons with that of propagating SPP excitations. The main limit of the approaches so far reported in literature is that they rely on highly ordered diffraction gratings fabricated by means of demanding nano-lithographic processes.In this work we demonstrate that an innovative, fully self-organized method based on wrinklingassisted Ion Beam Sputtering can be exploited to fabricate large area (cm 2 scale) nano-rippled soda-lime templates which conformally support ultrathin Au films deposited by physical deposition. The self-organized patterns act as quasi-1D gratings characterized by a remarkably high spatial order which matches properly the transverse photon coherence length. The gratings can thus enable the excitation of hybrid SPP modes confined at the Au/dielectric interfaces, with a resonant wavelength which can be tuned either by modifying the grating period, photon incidence angle or, potentially, the choice of the thin film conductive material. Surface Enhanced Raman Scattering experiments show promising gains in the range of 10 3 which are competitive, even before a systematic optimization of the sample fabrication parameters, with state-of-the art lithographic systems, demonstrating the potential of such templates for a broad range of optoelectronic applications aiming at plasmon-enhanced photon harvesting for molecular or biosensing.

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Au Gratings Fabricated by Interference Lithography for Experimental Study of Localized and Propagating Surface Plasmons

Cited by 9 publications

References 16 publications

Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation

Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation

Features of mechanical scanning probe lithography on graphene oxide and As(Ge)Se chalcogenide resist

Self-Organized Nanogratings for Large-Area Surface Plasmon Polariton Excitation and Surface-Enhanced Raman Spectroscopy Sensing

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