Atomically
thin semiconducting oxide on graphene carries a unique combination
of wide band gap, high charge carrier mobility, and optical transparency,
which can be widely applied for optoelectronics. However, study on
the epitaxial formation and properties of oxide monolayer on graphene
remains unexplored due to hydrophobic graphene surface and limits
of conventional bulk deposition technique. Here, we report atomic
scale study of heteroepitaxial growth and relationship of a single-atom-thick
ZnO layer on graphene using atomic layer deposition. We demonstrate
atom-by-atom growth of zinc and oxygen at the preferential zigzag
edge of a ZnO monolayer on graphene through in situ observation. We experimentally determine that the thinnest ZnO monolayer
has a wide band gap (up to 4.0 eV), due to quantum confinement and
graphene-like structure, and high optical transparency. This study
can lead to a new class of atomically thin two-dimensional heterostructures
of semiconducting oxides formed by highly controlled epitaxial growth.