2005
DOI: 10.1063/1.1870122
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Atomic layer deposition of ZnO on ultralow-density nanoporous silica aerogel monoliths

Abstract: We report on atomic layer deposition of an ∼ 2-nm-thick ZnO layer on the inner surface of ultralow-density (∼ 0.5% of the full density) nanoporous silica aerogel monoliths with an extremely large effective aspect ratio of ∼ 10 5 (defined as the ratio of the monolith thickness to the average pore size). The resultant monoliths are formed by amorphous-SiO2/wurtzite-ZnO nanoparticles which are randomly oriented and interconnected into an open-cell network with an apparent density of ∼ 3% and a surface area of ∼ 1… Show more

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Cited by 90 publications
(85 citation statements)
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“…Figure 1 From the SEM images, the ZnO coatings appear conformal for each thickness of ZnO deposited, consistant with previous reports. [9,13] The aerogel films remain porous after coating with ZnO, and the porosity is observed to decrease as expected with additional growth of ZnO. In addition, the feature size of the coated aerogels closely matches twice the thickness of the deposited ZnO indicating that the original silica aerogel framework takes up a minimal amount of space as expected.…”
supporting
confidence: 58%
See 1 more Smart Citation
“…Figure 1 From the SEM images, the ZnO coatings appear conformal for each thickness of ZnO deposited, consistant with previous reports. [9,13] The aerogel films remain porous after coating with ZnO, and the porosity is observed to decrease as expected with additional growth of ZnO. In addition, the feature size of the coated aerogels closely matches twice the thickness of the deposited ZnO indicating that the original silica aerogel framework takes up a minimal amount of space as expected.…”
supporting
confidence: 58%
“…The aerogel templates are coated with ZnO via atomic layer deposition (ALD) to yield an electrically interconnected semiconductor core-shell nanoweb structure. [13,14] Because it is both a stepwise and conformal coating technique, ALD provides exceptional control over nanoscale device composition. The large number of materials accessible by ALD (including, but not limited to, TiO 2 , ZnO, SnO 2 , ZrO 2 , and NiO) makes the technique widely applicable for the development of new photoelectrodes.…”
mentioning
confidence: 99%
“…Zn L-edge XAS was used to investigate the electronic transitions from the Zn 2p core electrons into the Zn 4s and Zn 4d electronic states in the conduction band [34] and the final states were recorded in total electron yield (TEY) and total fluorescence yield (TFY) modes, which are surface-and bulk-sensitive, respectively ( Figure 5). [35] The overall shape of the Zn L-edge XAS spectra is in good agreement with previously reported data.…”
Section: Resultsmentioning
confidence: 99%
“…Thus the Knudsen diffusion coefficient (D K ) of the gas in the capillary is given by (14) Because the porous alumina is not well represented by a collection of straight cylindrical capillaries, the d C of the capillary is generally replaced by an equivalent diameter (d e ) of pores obtained from experimental values of the specific surface area (S), porosity (ε) and apparent density (ρ M )of the porous monolith. 28 The equivalent diameter (d e ) is simply the diameter of the pore when the alumina has the same surface-to-volume ratio with the capillary, i.e., area of a capillary/volume of a capillary = 4/d C , and, (15) Then the Knudsen diffusion coefficient is given by (16) By using Eq. (16), the Knudsen diffusion coefficients of DEZ and TiCl 4 are evaluated to be ~1.02 × 10 −2 and ~8.27 × 10 −3 cm 2 /s, respectively.…”
Section: Methodsmentioning
confidence: 99%
“…[10][11][12] However, for the conformal deposition on porous materials, the exposure time of precursor molecules should be much longer comparing with the exposure time on a flat substrate, because the chemisorption of the precursor is limited by the Knudsen diffusion on the internal surface of the porous materials. [13][14][15][16][17][18][19][20][21] In smaller pores with a longer depth, it is more difficult for the precursor to reach vacant sites which locate at the core of the porous materials. In addition, the number of adsorption sites in the porous materials is much higher than that in the flat substrate, due to their high specific surface area.…”
mentioning
confidence: 99%