2006
DOI: 10.1016/j.tsf.2006.05.049
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Atomic layer deposition of palladium films on Al2O3 surfaces

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Cited by 163 publications
(207 citation statements)
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“…Recently, porous anodic aluminum oxide (AAO), a highly ordered nano-pore array, has attracted considerable attention as a nanotemplate for the synthesis of various nanostructures, 1 such as nanowires, 2-4 nanotubes, 5 nanodots, 6,7 semiconductors, 4,8 and superconductors. 9 These applications involve electrochemical deposition, 2,3 atomic layer deposition, 6,7 and chemical vapor deposition.…”
Section: Introductionmentioning
confidence: 99%
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“…Recently, porous anodic aluminum oxide (AAO), a highly ordered nano-pore array, has attracted considerable attention as a nanotemplate for the synthesis of various nanostructures, 1 such as nanowires, 2-4 nanotubes, 5 nanodots, 6,7 semiconductors, 4,8 and superconductors. 9 These applications involve electrochemical deposition, 2,3 atomic layer deposition, 6,7 and chemical vapor deposition.…”
Section: Introductionmentioning
confidence: 99%
“…9 These applications involve electrochemical deposition, 2,3 atomic layer deposition, 6,7 and chemical vapor deposition. 10 Porous alumina membrane formed by the anodization of aluminum consists of a close-packed array of hexagonal cells, each containing a cylindrical central pore.…”
Section: Introductionmentioning
confidence: 99%
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“…To gain new properties of materials related to their nanometric size in at least one dimension, nanowires [2][3][4][5][6][7][8][9][10][11], nanotubes [12,13] and nanodots [14,15] made of various materials like metals and alloys [2-5, 14, 15], semiconductors [6,7], superconductors [8] and polymers [10][11][12][13] were obtained using various techniques, including electrochemical deposition [2][3][4][5][10][11][12], sol-gel technique [6,8], atomic layer deposition [14,15], and chemical vapor deposition [9]. Recently, fabrication of many devices based on anodic aluminum oxide (AAO) has been also reported [16][17][18][19].…”
Section: Introductionmentioning
confidence: 99%
“…This behavior is typical of most ALD metal oxides and results from the prompt nucleation or initiation of metal oxide ALD on most surfaces (due to the ubiquity of OH groups), and usually generates very uniform, continuous films. In contrast, the ALD of noble metals such as palladium often shows a long incubation period on oxide surfaces 7 . This nucleation delay stems from the difficulty in removing the ligands from the noble metal precursor bound to an oxide surface.…”
Section: Introductionmentioning
confidence: 99%