NiO-based electrocatalysts, known for their high activity,
stability,
and low cost in alkaline media, are recognized as promising candidates
for the oxygen evolution reaction (OER). In parallel, atomic layer
deposition (ALD) is actively researched for its ability to provide
precise control over the synthesis of ultrathin electrocatalytic films,
including film thickness, conformality, and chemical composition.
This study examines how NiO bulk and surface properties affect the
electrocatalytic performance for the OER while focusing on the prolonged
electrochemical activation process. Two ALD methods, namely, plasma-assisted
and thermal ALD, are employed as tools to deposit NiO films. Cyclic
voltammetry analysis of ∼10 nm films in 1.0 M KOH solution
reveals a multistep electrochemical activation process accompanied
by phase transformation and delamination of activated nanostructures.
The plasma-assisted ALD NiO film exhibits three times higher current
density at 1.8 V vs RHE than its thermal ALD counterpart due to enhanced
β-NiOOH formation during activation, thereby improving the OER
activity. Additionally, the rougher surface formed during activation
enhanced the overall catalytic activity of the films. The goal is
to unravel the relationship between material properties and the performance
of the resulting OER, specifically focusing on how the design of the
material by ALD can lead to the enhancement of its electrocatalytic
performance.