Atmospheric pressure plasma enhanced spatial ALD of silver

Abstract

Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. The authors have investigated the growth of thin silver films using a unique combination of atmospheric process elements: spatial atomic layer deposition and an atmospheric pressure surface dielectric barrier discharge plasma source. Silver films were grown on top of Si substrates with good purity as revealed by resistivity values as low as 18 lX cm and C-and F-levels below detection limits of energy dispersive x-ray analysis. The growth of the silver films starts through the nucleation of islands that subsequently coalesce. The authors show that the surface island morphology is dependent on surface diffusion, which can be controlled by temperature within the deposition temperature range of 100-120 C. V C 2014 American Vacuum Society.

Versatility of bilayer metal oxide coatings on silver nanowire networks for enhanced stability with minimal transparency loss

“…Increasing the coating temperature leads generally to better metallic oxide layers (more crystallized and compact layer), [47][48][49] however, for thermally sensitive substrates, plasma-enhanced SALD can be employed to significantly lower processing temperature (< 150 °C). 50,51 Therefore SALD coating deposition at low temperature is possible, potentially associated with a slight drawback effect on certain physical properties of the coated layers. In parallel AgNW networks can be optimized without the need of thermal treatment, this depends on the AgNW synthesis conditions (the latter probably leading to different AgNW surface chemistry).…”

Spatial Atomic Layer Deposition

“…Under the right operating conditions, these gas shields act as gas bearings, facilitating virtually frictionless movement between reactor and substrate. The group in TNO has also used this type of reactor to do plasma-activated SALD [22,23]. The same group has also developed an R2R type of reactor based on the close proximity approach similar to the one developed by George's group in Colorado (described above), but in this case, the gas-bearing principle is used (the web floated onto the gas flows coming out of the inner cylinder).…”

Silver Nanoparticles Fabricated Using Chemical Vapor Deposition and Atomic Layer Deposition Techniques: Properties, Applications and Perspectives: Review

“…The application of silver as an effective and relatively cheap antimicrobial agent in medical, cosmetic, and environmental technologies also led to the use of ALD techniques in these areas. According to previous reports, the following ALD techniques are used: (a) thermal ALD [56,57], (b) plasma-enhanced ALD (PEALD [58][59][60]),…”