2010
DOI: 10.1116/1.3374738
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Atmospheric oxygen plasma activation of silicon (100) surfaces

Abstract: Articles you may be interested inSurface functionalization of graphenelike materials by carbon monoxide atmospheric plasma treatment for improved wetting without structural degradation J. Vac. Sci. Technol. B 30, 03D107 (2012); 10.1116/1.3695337Study on surface modification of silicon using CHF3/O2 plasma for nano-imprint lithographya) Yttrium silicate formation on silicon: Effect of silicon preoxidation and nitridation on interface reaction kinetics Effects of ion irradiation on silicon oxidation in electron … Show more

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Cited by 38 publications
(31 citation statements)
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“…It may be possible to replace the UVO treatment with an oxygen plasma treatment of the Si surface to achieve a hydrophilic wettable surface for SnO 2 deposition without the formation of a barrier oxide layer but only a monolayer of oxide. 49 An added advantage of a plasma treatment is the resultant defective surface 50 that aids the surface recombination for carrier transport between Si and SnO 2 . To achieve a tandem efficiency of 30%, J SC 4 20 mA cm À2 , V OC 4 1.8 V and FF 4 0.8 (requiring R S o 2 O cm 2 ) will be required.…”
Section: à2mentioning
confidence: 99%
“…It may be possible to replace the UVO treatment with an oxygen plasma treatment of the Si surface to achieve a hydrophilic wettable surface for SnO 2 deposition without the formation of a barrier oxide layer but only a monolayer of oxide. 49 An added advantage of a plasma treatment is the resultant defective surface 50 that aids the surface recombination for carrier transport between Si and SnO 2 . To achieve a tandem efficiency of 30%, J SC 4 20 mA cm À2 , V OC 4 1.8 V and FF 4 0.8 (requiring R S o 2 O cm 2 ) will be required.…”
Section: à2mentioning
confidence: 99%
“…The solid lines in Fig. 14,38 An important figure of merit is the background concentration of organic contamination necessary to drive the adsorption process. (5) to the data.…”
Section: Discussionmentioning
confidence: 99%
“…[18][19][20][21][22][23][24][25] The isolated silanol groups tend to be the sites where selective adsorption takes place. 20 Habib et al 14 have shown that the native oxide on silicon exposed to the atmospheric pressure helium and oxygen plasma exhibits hydrophilic behavior with a water contact angle less than 5 . 20 Habib et al 14 have shown that the native oxide on silicon exposed to the atmospheric pressure helium and oxygen plasma exhibits hydrophilic behavior with a water contact angle less than 5 .…”
Section: Introductionmentioning
confidence: 99%
“…This process creates a monolayer of covalently bound oxygen on the surface of the wafer. [32] The bonds of this monolayer are highly strained and readily react with available atmospheric H 2 O to form hydroxyl groups on the surface. The hydroxyl groups were reacted with the silane coupling agent, APTMS, in a vacuum desiccator for at least 15 minutes to form a linker between the inorganic substrate and an organic end group (in this case, a primary amine).…”
Section: Methodsmentioning
confidence: 99%