Aspherical Lens Design Using Computational Lithography

Murakami, Seiro; Yanagida, Yasuko; Hatsuzawa, Takeshi

doi:10.1016/j.precisioneng.2017.06.011

Cited by 9 publications

(2 citation statements)

References 15 publications

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“…However, in recent 20 years, lithography has gradually become to be used for printing large patterns with 10-100 μm sizes. Typical application targets are fluidic devices, [1][2][3][4][5][6][7][8][9][10] lens arrays, [11][12][13][14][15][16][17] bio-chips, [18][19][20][21][22][23] molds for electroplating metals, [24][25][26] and others. In these cases, because only small numbers of products are required generally, high-cost lithography systems for the use of semiconductor or MEMS devices cannot be adopted.…”

Section: Introductionmentioning

confidence: 99%

Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel

Horiuchi¹,

Okiyama²,

Sato³

et al. 2020

Jpn. J. Appl. Phys.

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To utilize maskless lithography using a liquid-crystal-display (LCD) panel for printing thick resist patterns, a novel two-layer resist process was developed. In the past research, simple and low-cost maskless exposure system was developed using an LCD panel in place of a reticle. However, commercial LCDs were fabricated not to irradiate short-wavelength light rays for protecting human eyes. Therefore, only thin g-line resists have been applicable for printing patterns. Nevertheless, patterning in 10-100 μm thick resist is frequently required for fabricating fluidic devices, lens arrays, and others. For this reason, a conventional g-line resist was coated on a thick UV resist, and patterns of g-line resist formed using the LCD maskless lithography was used as exposure masks of the bottom layer UV resist. As a result, various test patterns with widths of down to 40 μm and almost vertical side walls were successfully printed in the 70 μm thick UV resist.

show abstract

Section: Introductionmentioning

confidence: 99%

Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel

Horiuchi¹,

Okiyama²,

Sato³

et al. 2020

Jpn. J. Appl. Phys.

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show abstract

“…Various fabrication methods of micro-lens arrays have been developed [8][9][10][11][12][13][14][15][16][17][18][19][20][21][22][23][24]. However, the authors thought that the concerned technology was inventive and most suitable for this application.…”

Section: Introductionmentioning

confidence: 99%

Performances of Fine-Pitch Lenticular Lens Arrays Fabricated Using Semi-Cylindrical Resist Patterns

Horiuchi

Kurata

Miyazawa

et al. 2019

J. Photopol. Sci. Technol.

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Utilizing semi-cylindrical patterns of negative resist SU-8, lenticular lens arrays with a fine lens pitch of 100 µm were fabricated. The patterns were formed on 240-µm thick quartz plates coated with 100-µm thick SU-8 by the defocused projection exposure using a normal reticle with 50-µm line-and-space (L&S) patterns. Because the SU-8 was almost transparent for visible light with wavelengths longer than 400 nm, the patterns were directly used as lenticular lens arrays as they were. Next, a lenticular lens array set was assembled by placing a quartz plate with the lens patterns on an apple picture covered with a film reticle of 50-µm L&S patterns. When the set was observed with great interest, two scenes of an apple and all black were successfully switched alternately. Because the lens pitch of 100 µm was considerably smaller than the conventional one of 254 µm, smoothness of the picture edge was notably improved especially at inclined parts of the pictures. However, the angle for switching the two scenes was as small as approximately 6º. It was discussed that the small angle switching was caused by the substantial thickness of the lens array set including thicknesses of the quartz plate and the reticle film, and the angle might be controllable by decreasing the thickness.

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Design of a reduced objective Lens fluorescence dPCR Gene chip detection system with high-throughput and large field of view

Otuboah

Jiao

Tian-yun

et al. 2019

Optik

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Aspherical Lens Design Using Computational Lithography

Cited by 9 publications

References 15 publications

Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel

Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel

Performances of Fine-Pitch Lenticular Lens Arrays Fabricated Using Semi-Cylindrical Resist Patterns

Design of a reduced objective Lens fluorescence dPCR Gene chip detection system with high-throughput and large field of view

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