2008
DOI: 10.1063/1.2888967
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Arsenic δ-doped HgTe∕HgCdTe superlattices grown by molecular beam epitaxy

Abstract: Arsenic incorporation in HgTe/ Hg 0.05 Cd 0.95 Te superlattices grown by molecular beam epitaxy ͑MBE͒ is reported. The incorporation was carried out by a ␦-doping approach where arsenic was incorporated during MBE growth as acceptors. The superlattices were characterized via high resolution x-ray diffraction, Fourier transform infrared spectroscopy, secondary ion mass spectrometry, and magnetotransport Hall measurements coupled with the quantitative mobility spectrum analysis algorithm.

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Cited by 9 publications
(4 citation statements)
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“…Similar results indicating the dominance by lattice scattering have been observed in HgTe/HgCdTe multilayers as well. 32 The good match between experimental data from two different samples and their agreement with the calculated mobilities without using any adjustable parameters demonstrates the dominant behavior of phonons in this temperature range. Thus the mobilities for the bulk samples are also similar to those obtained in the epilayer.…”
Section: Resultsmentioning
confidence: 53%
“…Similar results indicating the dominance by lattice scattering have been observed in HgTe/HgCdTe multilayers as well. 32 The good match between experimental data from two different samples and their agreement with the calculated mobilities without using any adjustable parameters demonstrates the dominant behavior of phonons in this temperature range. Thus the mobilities for the bulk samples are also similar to those obtained in the epilayer.…”
Section: Resultsmentioning
confidence: 53%
“…The detailed description of the sample growth as well as the determination of the HgTe-well and HgCdTebarrier thicknesses can be found elsewhere. 29 For the PL measurements, the step-scan FTIR spectrometer-based modulated PL technique was employed. 22,28 A combination of KBr beamsplitter and liquid-nitrogen cooled PC HgCdTe detector was selected for the FTIR spectrometer (Bruker IFS 66v/S), 24 and the spectral resolution was set to be better than 1.0 meV so as to discriminate weak and energetically close-positioned PL features.…”
Section: Methodsmentioning
confidence: 99%
“…The N doping is performed simultaneously with the incorporation of Te, which is expected to enhance the N incorporation rate. Later, ␦-doping was used for fabricating p-type GaN and HgTe thin films and obtained a good result [17,18]. Moreover, it has been reported that ␦-doping can reduce the density of threading dislocations in the highly faulted nitride layers and, therefore, to improve the crystalline structure of the host semiconductor [19].…”
Section: Introductionmentioning
confidence: 99%