2016
DOI: 10.1016/j.optmat.2015.12.040
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Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application

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Cited by 81 publications
(42 citation statements)
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“…The most critical step of this fabrication sequence is the RIE process. Different gases and parameters have been investigated to dry etch lithium niobate . One of the main issues, when etching lithium niobate with fluoride based gases is the formation of crystalline lithium fluoride (LiF) particles at the surface, causing a rough lithium niobate surface unsuitable for optical applications.…”
Section: Photonic Building Blocks In Lnoimentioning
confidence: 99%
See 1 more Smart Citation
“…The most critical step of this fabrication sequence is the RIE process. Different gases and parameters have been investigated to dry etch lithium niobate . One of the main issues, when etching lithium niobate with fluoride based gases is the formation of crystalline lithium fluoride (LiF) particles at the surface, causing a rough lithium niobate surface unsuitable for optical applications.…”
Section: Photonic Building Blocks In Lnoimentioning
confidence: 99%
“…The formation of LiF can be reduced by choosing appropriate etching parameters or exchanging the lithium with hydrogen ions by a proton exchange process . The LiF formation can be eliminated by avoiding the use of fluoride based etching gases, such as when using only physical etching by argon milling . This process is very promising as it was successfully used to achieve wire waveguides with losses as low as 3 dB/cm and bending radii <20 μm for telecommunication C‐band wavelengths.…”
Section: Photonic Building Blocks In Lnoimentioning
confidence: 99%
“…The shape of the cross-section of the waveguide is trapezoidal, which is inevitable due to redeposition of lithium niobate in the dry etching process. 34 Our waveguide has a side wall angle of 73.5° on both sides. Figure 1(b) shows effective refractive indices of three modes for vertically polarized 1550-nm light as a function of waveguide-top width.…”
Section: Device Design and Fabricationmentioning
confidence: 99%
“…12 However, LN nanostructures are difficult to fabricate with low loss, due to its inert chemical properties and physical hardness. 15,16 Due to those difficulties, research interests in the pursuit of second-order nonlinear nanophotonics have shifted to other materials that are easier to integrate, such as AlN,17 GaAs, 18 InP, 19 and BaTio3. 20 However, the success has been limited as none of those materials could match the excellent optical properties of LN.…”
Section: Introductionmentioning
confidence: 99%