2009
DOI: 10.1063/1.3126956
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Appropriate choice of channel ratio in thin-film transistors for the exact determination of field-effect mobility

Abstract: Field-effect mobilities are the most important figures of merit to evaluate the feasibility of semiconductors for thin-film transistors ͑TFTs͒. They are, however, sometimes extracted from TFTs with the active semiconductor area undefined and in small channel ratios without the effect of the fringing electric field at the ends of source/drain electrodes taken into account. In this letter, it is demonstrated that the field-effect mobilities extracted from undefined nanoparticulate zinc oxide ͑ZnO͒ TFTs at the ch… Show more

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Cited by 69 publications
(54 citation statements)
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“…The mobility extracted at the ratio of W/L = 1000/150 μm is expected to be overestimated by approx. twofold [15]. The control InO x device had a high field-effect mobility (μ sat ), SS value, V th , and I ON/OFF of 5.0 cm 2 /V s, 0.46 V/decade, 3.8 V, and 5.1 × 10 6 , respectively.…”
Section: Resultsmentioning
confidence: 99%
“…The mobility extracted at the ratio of W/L = 1000/150 μm is expected to be overestimated by approx. twofold [15]. The control InO x device had a high field-effect mobility (μ sat ), SS value, V th , and I ON/OFF of 5.0 cm 2 /V s, 0.46 V/decade, 3.8 V, and 5.1 × 10 6 , respectively.…”
Section: Resultsmentioning
confidence: 99%
“…Before the electrical measurement, all devices were patterned by mechanical scratches to avoid the fringe current. [66,67] All the OFETs were characterized in a nitrogen glove box at room temperature. As transfer curves shown in…”
Section: Doi: 101002/advs201900775mentioning
confidence: 99%
“…[5] Therefore, the ideal route for the next-generation AOS-based transistor technology should comprise an indium-and gallium-free semiconductor material, providing at least comparable performance and processing temperature to IGZO. [11] A very recent work by Han et al [12] is the exception to this, where a remarkable saturation mobility (µ sat ) of 67 cm 2 V −1 s −1 is achieved for polycrystalline tin-doped Zinc-tin oxide (ZTO) is widely invoked as a promising indium and galliumfree alternative for amorphous oxide semiconductor based thin-film transistors (TFTs). Chiang et al [6] reported in 2005 the first successful integration of sputtered ZTO as semiconductor layer in TFTs.…”
mentioning
confidence: 99%