Applications of dip-pen nanolithography

Salaita, Khalid; Wang, YuHuang; Mirkin, Chad A.

doi:10.1038/nnano.2007.39

Cited by 811 publications

(623 citation statements)

References 123 publications

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“…Given the total amount M, diffusion coefficient D, and critical concentration C 0 are all constants for a certain system, the second term, ln 2CðpDÞ 1=2 M , is also a constant. If we regard x 2 4t as the independent variable and À 1 2 lnðtÞ as the functional variable in equation [2], the diffusion coefficient, D, can be regarded as the inversion of slope in equation [2]. Since the difference between the well-ordered SAMs and EG 3 or EG 6 will only influence the concentration of EG 3 or EG 6 , C, in equation [2] and will not change the slope in this equation.…”

Section: Resultsmentioning

confidence: 99%

“…In recent years, SAMs found wide applications in chemistry, physics, and especial biology [2][3][4][5] when SAMs combined with microfluidic technology [6][7][8][9][10]; for example, we applied alkanethiolate SAMs on gold surface to study the relationship between the shape of mammalian cells and their migration direction [11]. Recently, when we applied alkanethiolate SAMs combined with microfluidic technology to establish interaction models for multiple types of cells [12], we found that the SAMs diffused on the surfaces of evaporation-coated gold slides which were covered with polydimethylsiloxan (PDMS) stamps [13].…”

Section: Introductionmentioning

confidence: 99%

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Diffusion of self-assembled monolayers of thiols on the gold surfaces covered with polydimethylsiloxane stamps

et al. 2014

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Thiols can diffuse and form self-assembled monolayers (SAMs) on the gold surfaces covered with polydimethylsiloxane (PDMS) stamps. For the first time, with cells as the indicator of how far alkanethiols had diffused to form SAM, we studied the growth dynamics of SAMs of HS(CH 2 ) 11 (OCH 2 CH 2 ) 3 OH (EG 3 ) and HS(CH 2 ) 11 (OCH 2 CH 2 ) 6 OH (EG 6 ) on the gold surfaces covered with PDMS stamps. The growth of SAMs is well described by one-dimensional diffusion from a line source of concentration, with surface diffusion coefficient of 193.4 ± 19.2 lm 2 /min (EG 3 ) and 95.8 ± 18.9 lm 2 /min (EG 6 ).

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Diffusion of self-assembled monolayers of thiols on the gold surfaces covered with polydimethylsiloxane stamps

et al. 2014

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“…Dip-pen scanning probe lithography (dp-SPL) offers high resolution and registration with direct write patterning capabilities 106 . The lithography functions by facilitating the direct transport of molecules to surfaces, much like the transfer of ink from a macroscopic dip-pen to paper.…”

Section: Additional Spl Methodsmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on the methods and processes that offer genuinely lithography capabilities such as those based on thermal effects, chemical reactions and voltage-induced processes. Published in:Nature Nanotechnology 9, 577-587 (2014) Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometre-scale structures. A variety of materials and systems such as nanoparticles, nanowires, two-dimensional materials like graphene and transition metal dichalcogenides, plasmonics materials, conjugated polymers and organic semiconductors are finding applications in nanoelectronics, nanophotonics, organic electronics and biomedical applications. The success of many of the above applications relies on the existence of suitable nanolithography approaches. However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 . Figure 1a shows a general scheme of SPL operation. There is a variety of approaches to modify a material in a probe-surface interface which have generated several SPL methods. Scanning probe lithographies can be either classified by emphasizing the distinction between the general nature of the process, chemical versus physical, or by considering if SPL implies the removal or addition of material. However, we consider it is more inclusive and systematic to classify the different SPL methods in terms of the driving mechanisms used in the patterning process, namely thermal, electrical, mechanical and diffusive methods (Fig. 1b). Challenges in nanoscale lithographyThe workhorse of large volume CMOS fabrication, o...

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“…4,5 While many fabrication methods abound, 6 probebased techniques, such as dip pen 7 and fountain pen 8 lithography, electrospinning, 9 scanning electrochemical microscopy 10,11 and meniscus-based methods [12][13][14][15][16][17][18][19][20] offer exciting new ways to fabricate novel structures. Previous meniscus-based fabrication techniques 20 have made structures that have tended to make contact with a substrate at a limited number of points.…”

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confidence: 99%