2017
DOI: 10.3390/s17102204
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Application of CMOS Technology to Silicon Photomultiplier Sensors

Abstract: We use the 180 nm GLOBALFOUNDRIES (GF) BCDLite CMOS process for the production of a silicon photomultiplier prototype. We study the main characteristics of the developed sensor in comparison with commercial SiPMs obtained in custom technologies and other SiPMs developed with CMOS-compatible processes. We support our discussion with a transient modeling of the detection process of the silicon photomultiplier as well as with a series of static and dynamic experimental measurements in dark and illuminated environ… Show more

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Cited by 14 publications
(17 citation statements)
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References 61 publications
(77 reference statements)
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“…In recent years, we have witnessed an improvement both in the development of dedicated SiPM technology based on the complementary metal oxide semiconductor (CMOS) process [ 51 , 52 ] and in the realization of related high bandwidth digital readout electronics for PET [ 53 , 54 , 55 , 56 , 57 , 58 , 59 , 60 , 61 , 62 , 63 ]. As a possible solution to the sampling-rate challenge, we have previously proposed a multi voltage threshold (MVT) sampling method that takes samples of a pulse with respect to a set of reference voltages.…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, we have witnessed an improvement both in the development of dedicated SiPM technology based on the complementary metal oxide semiconductor (CMOS) process [ 51 , 52 ] and in the realization of related high bandwidth digital readout electronics for PET [ 53 , 54 , 55 , 56 , 57 , 58 , 59 , 60 , 61 , 62 , 63 ]. As a possible solution to the sampling-rate challenge, we have previously proposed a multi voltage threshold (MVT) sampling method that takes samples of a pulse with respect to a set of reference voltages.…”
Section: Introductionmentioning
confidence: 99%
“…In this work, we have developed and characterized novel SiPMs in a 0.16 µm–BCD technology. Table 1 summarizes the performance of the fabricated SiPMs and compares it to the best commercially-available SiPMs (e.g., from SensL [ 20 ], Hamamatsu [ 21 ], AdvanSiD [ 22 ], Excelitas [ 23 ], Broadcom [ 24 ] and Ketek [ 25 ]), to the CMOS analog SiPM reported in [ 7 ] and to the BCD analog SiPM reported in [ 8 ].…”
Section: Discussionmentioning
confidence: 99%
“…Commercially-available SiPMs exploit custom fabrication technologies for optimizing their performance. However, efforts are underway to fabricate SiPMs in CMOS [ 7 ] and BCD [ 8 ] technologies, aiming at cost-effective systems-on-chip (SoC) based on SiPM detectors. Finally, digital SiPMs (dSiPMs), where each pixel integrates an active quenching circuit and provides a digital output to on-chip digital processing electronics, have been demonstrated [ 9 ].…”
Section: Introductionmentioning
confidence: 99%
“…The design follows the guidelines already presented in [35]. The cross-section of a sensitive cell of the SiPM is shown on Fig.…”
Section: A Device Fabricationmentioning
confidence: 99%
“…Several tests of SiPM and SiPM-like detection structures were reported in the literature using 0.8 μm [11]- [19], 0.7 μm [20], 0.5 μm [21], [22], 0.35 μm [23]- [34], 0.18 μm [6], [35]- [38], 0.15 μm [39], 0.13 μm [40]- [45], 0.09 μm [46], [47] CMOS processes. Avalanche diode structures compatible with standard nanometer scale CMOS technology [48] and based on SiGe [49] are also being studied.…”
Section: Introductionmentioning
confidence: 99%