Application of carbon-aluminum nanostructures in divertor coatings from fusion reactor

Ciupină, V.; Lungu, C.P.; Vladoiu, R.; Epure, T. D.; Prodan, G.; Poroşnicu, C.; Prodan, M.; Stanescu, I. M.; Contulov, M.; Mandes, Aurelia; Dinca, Virginia; Zarovschi, V.

doi:10.1117/12.930443

Cited by 2 publications

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“…The W films were pure and contained a thin surface layer of WO 3 (oxygen probably coming from rests of water vapors that desorbed from chamber walls at elevated temperature). The authors of [214] prepared the functional fusion related materials by TVA and combined magnetron sputtering and ion implantation (CMSII): W films on Si substrate and Ni films of fine grain graphite (FGG). The analysis of the thickness uniformity was performed by X-ray fluorescence (XRF) and its modifications for thinner layers (< few microns) micro-beam XRF (µ-XRF) and for thicker layers (>40 µm) high-energy XRF (HEXRF).…”

Section: Fusion-related Mixed Layersmentioning

confidence: 99%

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

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Section: Fusion-related Mixed Layersmentioning

confidence: 99%

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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“…Because the discharge sustaining gas is just the evaporating atoms in vacuum, the thin film deposition is carried out in high purity conditions. In this way it is possible to significantly improve the quality of the surfaces covered with different materials [12,13]. Experimental arrangement of TVA system used for depositions of the silicon carbide coatings is shown schematically in Fig.…”

Section: Experimental Set-upmentioning

confidence: 99%

Growth and Characterization of the High Purity C-Mg Thin Films Obtained by Thermionic Vacuum Arc (TVA) Technology

Mandes

Vladoiu

Dinca

et al. 2013

AMR

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We investigated the growth and structure properties of C-Mg thin films obtained for the first time by Thermionic Vacuum Arc (TVA) deposition. The TVA technology is suitable for producing nanostructured materials because of the high power density of the vapor plasma generated by accelerated electron flux from the cathode and high energy of the ions incident on the depositing film, both these properties ensuring a high dispersion of the evaporated material. The properties of the deposited C-Mg thin films were investigated in terms of wettability and morphology. The surface free energy (SFE) was determined by means of Surface Energy Evaluation System (See System) indicating a hydrophobic character and the morphology were determined from BF-TEM image performed by Philips CM 120 ST TEM system.

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Application of carbon-aluminum nanostructures in divertor coatings from fusion reactor

Cited by 2 publications

References 0 publications

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

Growth and Characterization of the High Purity C-Mg Thin Films Obtained by Thermionic Vacuum Arc (TVA) Technology

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