Apparatus to measure electron reflection

Abstract

Articles you may be interested inHigh-current electron optical design for reflective electron beam lithography direct write lithography Controlling reflection of electrons from an array of electrodes is a key feature of an electron lithography system currently under development. Here the authors describe a technique for characterizing this control. The apparatus is only 30 mm long, features simple colinear electron optics and a photocathode that emits a well-directed, monochromatic beam. The overall energy resolution is better than 1 eV.