Antireflection of transparent polymers by advanced plasma etching procedures

Schulz, Ulrike; Munzert, Peter; Leitel, Robert; Wendling, Irmina; Kaiser, Norbert; Tünnermann, Andreas

doi:10.1364/oe.15.013108

Cited by 96 publications

(35 citation statements)

References 9 publications

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“…Moreover the presence of nanostructures has been reported to be a key for the reduction of the light reflectance (so-called motheye effect) of transparent polymers, important for many optical applications: the basic principle is to mix the polymer material with air on a subwavelength scale so that the effective refractive index is reduced [5].…”

Section: Introductionmentioning

confidence: 99%

Fluorocarbon plasmas for nanotexturing of polymers: A route to water-repellent antireflective surfaces

Mundo

Benedictis

Palumbo

et al. 2009

Applied Surface Science

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Section: Introductionmentioning

confidence: 99%

Fluorocarbon plasmas for nanotexturing of polymers: A route to water-repellent antireflective surfaces

Mundo

Benedictis

Palumbo

et al. 2009

Applied Surface Science

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“…Researchers speculated that these protrusions develop on polymer surfaces via various surface dynamic phenomena-including surface migration, etching, redeposition, and agglomeration-of highly volatile low-molecular-weight (LMW) polymer chains that form at the top surface of polymer substrates by random ion-induced chain scission. [34][35][36][37][38][39][40][41] In this study, the nanoscopic polymer protrusions developed with a morphological feature in the form of elongated globular shapes (Fig. S1 †).…”

Section: Resultsmentioning

confidence: 99%

Highly efficient and bendable organic solar cells using a three-dimensional transparent conducting electrode

et al. 2014

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A three-dimensional (3D) transparent conducting electrode, consisting of a quasi-periodic array of discrete indium-tin-oxide (ITO) nanoparticles superimposed on a highly conducting oxide-metal-oxide multilayer using ITO and silver oxide (AgOx) as oxide and metal layers, respectively, is synthesized on a polymer substrate and used as an anode in highly flexible organic solar cells (OSCs). The 3D electrode is fabricated using vacuum sputtering sequences to achieve self-assembly of distinct ITO nanoparticles on a continuous ITO-AgOx-ITO multilayer at room-temperature without applying conventional high-temperature vapour-liquid-solid growth, solution-based nanoparticle coating, or complicated nanopatterning techniques. Since the 3D electrode enhances the hole-extraction rate in OSCs owing to its high surface area and low effective series resistance for hole transport, OSCs based on this 3D electrode exhibit a power conversion efficiency that is 11-22% higher than that achievable in OSCs by means of conventional planar ITO film-type electrodes. A record high efficiency of 6.74% can be achieved in a bendable OSC fabricated on a poly(ethylene terephthalate) substrate.

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“…It is now well established that a graded transition between the refractive indices of two interfacing media has perfect AR property 8,9 . Many different technologies have been developed during the last decades to artificially realize biomimetic AR structures and gradedrefractive-index (GRIN) coatings [10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28] . An overview of the different fabrication techniques is presented in references 29,30 .…”

Section: Introductionmentioning

confidence: 99%

Wideband antireflection coatings combining interference multilayers and subwavelength structures prepared by reactive ion etching

Bruynooghe¹,

Helgert²,

Challier³

et al. 2015

SPIE Proceedings

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To further reduce the intensity of the Fresnel reflections of optical components, subwavelength structures prepared by reactive ion etching of SiO 2 thin films are combined as outermost layer with a multilayer system made of conventional thin film materials and prepared by magnetron sputtering. In this approach, a hybrid coating is realized in which the nanoscaled structured outermost layer is expected to further improve the antireflection properties of common interference stacks. The subwavelength structures are examined by spectroscopic ellipsometry, spectral photometry and scanning electron microscopy. The microscopic and optical spectroscopic analysis revealed that pillar-shaped nanostructures are formed during etching which exhibit low-index properties and have a depth-dependent refractive index. To take into account the index gradient in the coating design, the optical properties of the nanostructures are modeled using the effective medium approximation. The calculated average effective refractive index is 1.11 at 500 nm wavelength. A hybrid coating was designed to minimize the residual reflectance in the 400 -900 nm spectral range for BK7 glass substrate. Experimental results showed that the hybrid coating achieves a low residual reflectance with very good omni-directional properties, owing to the properties of its nanostructured surface. The residual reflection of the hybrid coating is found to be two times smaller than the reflection obtained by applying a common interference multilayer system which demonstrates the benefit of the use of hybrid systems for the realization of broadband antireflective coatings with wide-angle properties. Keyword list Antireflection coatingsSubwavelength structures Hybrid coating system Nanostructured Thin Films VIII, edited by Akhlesh Lakhtakia, Tom G. Mackay, Motofumi Suzuki, Proc. of SPIE Vol. 9558, 955804 · © 2015 SPIE · CCC code: 0277-786X/15/$18 ·

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Antireflection of transparent polymers by advanced plasma etching procedures

Cited by 96 publications

References 9 publications

Fluorocarbon plasmas for nanotexturing of polymers: A route to water-repellent antireflective surfaces

Fluorocarbon plasmas for nanotexturing of polymers: A route to water-repellent antireflective surfaces

Highly efficient and bendable organic solar cells using a three-dimensional transparent conducting electrode

Wideband antireflection coatings combining interference multilayers and subwavelength structures prepared by reactive ion etching

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