2008
DOI: 10.1063/1.2901878
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Anomalous increase in hot-carrier-induced threshold voltage shift in n-type drain extended metal-oxide-semiconductor transistors

Abstract: Articles you may be interested inAbnormal threshold voltage shift under hot carrier stress in Ti1−xNx/HfO2 p-channel metal-oxide-semiconductor field-effect transistors Technology computer-aided design simulation study for a strained InGaAs channel n -type metal-oxidesemiconductor field-effect transistor with a high-k dielectric oxide layer and a metal gate electrodea) J. Vac. Sci. Technol. B 29, 032203 (2011); 10.1116/1.3578466 Channel length dependence of hot-carrier-induced degradation in n -type drain exten… Show more

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