Annealing effects on silicon-rich oxide films studied by spectroscopic ellipsometry

Spiga, S.; Tallarida, G.; Borghesi, A.; Sassella, A.; Santi, G. De

doi:10.1016/s0040-6090(98)00423-4

Cited by 11 publications

(5 citation statements)

References 12 publications

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“…The optical properties of silicon oxide films have been the subject of several articles [3][4][5][6][7]. It is not unusual to observe a wide disparity in the values of the optical constants (refractive, n, and absorption, k, indices).…”

Section: Introductionmentioning

confidence: 99%

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Characterization of thin films of a-SiO_x(1.1<x<2.0) prepared by reactive evaporation of SiO

Durrani¹,

Al-Kuhaili²,

Khawaja³

2003

J. Phys.: Condens. Matter

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Thin films of a-SiO x with values of x ranging from 1.13 to 1.89 were prepared by reactive evaporation of SiO in a controlled oxygen environment. The oxygen pressure in the deposition chamber was varied so as to obtain films with different values of x. The films were studied by x-ray photoelectron spectroscopy and optical spectrophotometry. An attempt was made to analyse the Si 2p corelevel spectra in terms of five chemically shifted components corresponding to basic Si bonding units Si-(Si 4−n O n ) with n = 0, 1, . . . , 4. The concentration of these bonding units as a function of oxygen concentration was in reasonable agreement with the random-bonding model, with the exception that the Si-(Si 3 O) component was almost completely suppressed for all stoichiometries. Films with x < 1.65 consisted of elemental Si and oxides of silicon, while those with x 1.65 were almost free of Si. Films containing Si have higher refractive indices and degrees of absorption in the visible region compared with those which were free of Si.The optical properties of the films approach those of fused silica (SiO 2 ) as the values of x increase. For the films with the largest value of x (=1.89), the refractive index is smaller than that of fused silica. The density of these films was estimated to be smaller than that of fused silica by about 13%.

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Section: Introductionmentioning

confidence: 99%

“…Only the influence of the deposition conditions (i.e. substrate temperature, deposition rate, oxygen pressure) as well as the method of producing the film can account for these widely divergent values [3][4][5][6][7]. Optical properties of oxide films are dependent on chemical composition and microstructure.…”

Section: Introductionmentioning

confidence: 99%

Characterization of thin films of a-SiO_x(1.1<x<2.0) prepared by reactive evaporation of SiO

Durrani¹,

Al-Kuhaili²,

Khawaja³

2003

J. Phys.: Condens. Matter

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“…Further, as revealed by literature34 silicon rich SiO x coatings possess a higher refractive index than the fused‐silica. The refractive index of fused‐silica is 1.46 and in our case the refractive index value of silica‐like film is 1.487.…”

Section: Resultsmentioning

confidence: 66%

Interaction of Plasma Deposited HMDSO-Based Coatings with Fibrinogen and Human Blood Plasma: The Correlation between Bulk Plasma, Surface Characteristics and Biomolecule Interaction

Gandhiraman

Muniyappa

Dudek

et al. 2010

Plasma Processes Polym.

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y These authors contributed equally.The success of a biomaterial depends on the nature of interaction and the progressive reaction between the biological components and the surface of the biomaterial. In order to control the interaction between the biomaterial and biological component, it is necessary to understand the factors that influence the protein adsorption and cell proliferation. Surface chemistry plays a crucial role in the success of any blood contacting biomaterial. Plasma enhanced chemical vapour deposition (PECVD) is an interesting commonly used technique for tailoring surface characteristics while retaining bulk material properties. Two different films, namely polymer-like and silica-like coatings, with varying surface characteristics have been deposited from hexamethyldisiloxane, by PECVD, on 316L stainless steel. A correlation between the bulk plasma, interfacial adhesion of the coating to 316L steel, surface characteristics and biomolecule interaction is presented in this work. The interfacial adhesion strength analysis demonstrated that silica-like coatings have higher adhesion strength to 316L stainless steel than polymer-like coatings, caused due to the formation of a strong FeÀOÀSi and ÀCrÀOÀSi bonds. It was observed that the effect of nanoscale surface roughness (close to 6 nm) was less significant, and that the surface chemistry played a significant role in governing the fibrinogen adsorption. Highest fibrinogen adsorption on plain steel was due to the electrostatic interaction of the metal oxide layer with the protein. Hydrophobicity of the polymer-like film resulted in a higher fibrinogen binding than the silicalike films.

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“…The Bruggeman-EMA considers the material as constituted by different macroscopic phases characterized by their bulk dielectric functions. In the case of a mixture on the atomic scale (Si-Si and Si-O for SiO x , for example), the Sellmeier model (see, e.g., [13]) is adopted, because it is quite good at reproducing the dispersion of the refraction index in the transparent region. According to this model, the dispersion formulas for n and k can be written as…”

Section: Parametrization Of Layer Dielectric Functionsmentioning

confidence: 99%

Characterization of nanoscaled films on flat and grating substrates as some elements of plasmonics

Dmitruk¹

2007

Semicond. phys. quantum electron. optoelectron.

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The optical properties of multilayer structures consisting of dielectric, conductivity-oxide and nanoscaled metal layers, deposited on the planar substrates (witness samples) and surface relief ones (diffraction gratings) with micro-and nanoscale sizes, are investigated by AFM, spectral ellipsometry (SE), and photometric techniques. The SE-measured parameters are related to actual characteristics of the layers when specified the model of their near-surface regions. Using a parametrization of the layer dielectric function versus the wavelength and a fitting procedure, the dielectric parameters are determined. It is shown that the optical constants are affected by both the substrate morphology and the adjacent medium. Preliminary data about the influence of isolated particle plasmon excitations in 2D-substrates with the top nanoscaled Au layer on its optical properties are presented.

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Annealing effects on silicon-rich oxide films studied by spectroscopic ellipsometry

Cited by 11 publications

References 12 publications

Characterization of thin films of a-SiO_x(1.1<x<2.0) prepared by reactive evaporation of SiO

Characterization of thin films of a-SiO_x(1.1<x<2.0) prepared by reactive evaporation of SiO

Interaction of Plasma Deposited HMDSO-Based Coatings with Fibrinogen and Human Blood Plasma: The Correlation between Bulk Plasma, Surface Characteristics and Biomolecule Interaction

Characterization of nanoscaled films on flat and grating substrates as some elements of plasmonics

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Annealing effects on silicon-rich oxide films studied by spectroscopic ellipsometry

Cited by 11 publications

References 12 publications

Characterization of thin films of a-SiOx(1.1<x<2.0) prepared by reactive evaporation of SiO

Characterization of thin films of a-SiOx(1.1<x<2.0) prepared by reactive evaporation of SiO

Interaction of Plasma Deposited HMDSO-Based Coatings with Fibrinogen and Human Blood Plasma: The Correlation between Bulk Plasma, Surface Characteristics and Biomolecule Interaction

Characterization of nanoscaled films on flat and grating substrates as some elements of plasmonics

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Characterization of thin films of a-SiO_x(1.1<x<2.0) prepared by reactive evaporation of SiO

Characterization of thin films of a-SiO_x(1.1<x<2.0) prepared by reactive evaporation of SiO