Annealing effects on physical properties of a Au/a-Si:H Schottky diode prepared via the plasma-enhanced chemical vapor deposition technique

Elghoul, N.; Kraı̈em, S.; Rahmouni, H.; Khirouni, K.

doi:10.1016/j.jpcs.2019.04.006

Cited by 5 publications

(3 citation statements)

References 59 publications

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“…However, at even higher temperatures, powder formation usually occurs (Zone 3). For economic reasons, most of the CVD reactors in operation are restricted to Zone 2 [109][110][111][112][113]. When a uniform composite coating layer on a substrate with a complex geometry is the first major consideration, CVD processes generally work in region 1 of the diagram in Figure 4.…”

Section: Kinetics Of Reactions and Coating Production In The Cvd Processmentioning

confidence: 99%

“…Figure 5 shows the steps that take place for the deposition of ceramic nanocomposite coatings during the CVD process. They can be summarized as follows [109][110][111]: Pre-Interaction: Convection transfer of reactive materials to the metal or nonmetallic substrate by the formation of diffusive flow.…”

Section: Kinetics Of Reactions and Coating Production In The Cvd Processmentioning

confidence: 99%

“…Figure 5 shows the steps that take place for the deposition of ceramic nanocomposite coatings during the CVD process. They can be summarized as follows [109][110][111]:…”

Section: Kinetics Of Reactions and Coating Production In The Cvd Processmentioning

confidence: 99%

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A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

et al. 2023

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Chemical vapor deposition (CVD) is a process that a solid is formed on a substrate by the chemical reaction in the vapor phase. Employing this technology, a wide range of materials, including ceramic nanocomposite coatings, dielectrics, and single crystalline silicon materials, can be coated on a variety of substrates. Among the factors influencing the design of a CVD system are the dimensions or geometry of the substrate, substrate temperature, chemical composition of the substrate, type of the deposition process, the temperature within the chamber, purity of the target material, and the economics of the production. Three major phenomena of surface reaction (kinetic), diffusion or mass transfer reaction, and desorption reaction are involved during the CVD process. Thermodynamically, CVD technology requires high temperatures and low pressures in most systems. Under such conditions, the Gibbs free energy of the chemical system quickly reaches its lowest value, resulting in the production of solids. The kinetic control of the CVD technology should always be used at low temperatures, and the diffusion control should be done at high temperatures. The coating in the CVD technology is deposited in the temperature range of 900–1400 °C. Overall, it is shown here that by controlling the temperature of the chamber and the purity of the precursors, together with the control of the flow rate of the precursors into the chamber, it is possible to partially control the deposition rate and the microstructure of the ceramic coatings during the CVD process.

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Section: Kinetics Of Reactions and Coating Production In The Cvd Processmentioning

confidence: 99%

Section: Kinetics Of Reactions and Coating Production In The Cvd Processmentioning

confidence: 99%

See 1 more Smart Citation

A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

et al. 2023

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Hydrogenation and annealing impact on Si/CdTe junction for solar energy application

Kumar

Singh

2023

International Journal of Hydrogen Energy

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AC electrical properties of Schottky diode based on nanocrystalline silicon thin films

Kraı̈em

Khirouni

SAlaya

2020

Physica B: Condensed Matter

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Annealing effects on physical properties of a Au/a-Si:H Schottky diode prepared via the plasma-enhanced chemical vapor deposition technique

Cited by 5 publications

References 59 publications

A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

A Review on Sustainable Manufacturing of Ceramic-Based Thin Films by Chemical Vapor Deposition (CVD): Reactions Kinetics and the Deposition Mechanisms

Hydrogenation and annealing impact on Si/CdTe junction for solar energy application

AC electrical properties of Schottky diode based on nanocrystalline silicon thin films

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