2005
DOI: 10.1016/j.jcrysgro.2005.07.031
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Annealing effect on properties of Zno thin films grown on LiNbO3 substrates by MOCVD

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Cited by 18 publications
(5 citation statements)
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“…The ZnO coated Al foil will often curl up due to large film residual stress. Post-annealing is a routine and effective method to reduce the film defects and stress, improve the microstructure, and enhance the acoustic wave properties of the ZnO thin film based acoustic wave devices on rigid substrates, such as silicon [17], glass [18], and LiNbO3 [19]. However, the influence of post-annealing on the structural, optical and SAW properties of ZnO thin films deposited on flexible substrates was not commonly reported [20][21][22][23][24].…”
Section: Introductionmentioning
confidence: 99%
“…The ZnO coated Al foil will often curl up due to large film residual stress. Post-annealing is a routine and effective method to reduce the film defects and stress, improve the microstructure, and enhance the acoustic wave properties of the ZnO thin film based acoustic wave devices on rigid substrates, such as silicon [17], glass [18], and LiNbO3 [19]. However, the influence of post-annealing on the structural, optical and SAW properties of ZnO thin films deposited on flexible substrates was not commonly reported [20][21][22][23][24].…”
Section: Introductionmentioning
confidence: 99%
“…For the MOCVD growth of zinc oxide, different precursors have been reported in the literature: often diethyl zinc (DEZ) [14,15]and dimethyl zinc (DMZ) [16] are used, resulting in the growth of highly pure ZnO films. Less attention has been paid to the growth of ZnO-films from zinc acetate [17] and zinc acetylacetonate (Zn(acac) 2 ) [18][19][20], because it is reported that these precursors tend to produce carbon contaminations.…”
Section: Introductionmentioning
confidence: 99%
“…ZnO films have been prepared by various dry processes such as pulsed laser deposition (PLD) [8], metal organic chemical vapor deposition (MOCVD) [9], chemical vapor deposition (CVD) [10], molecular beam epitaxy (MBE) [11], magnetron sputtering [12], and electron beam evaporation [13]. Wet processes such as electrochemical deposition [14], spray pyrolysis [15,16], sol-gel [17], and hydrothermal method [18][19][20][21] are also valuable for the preparation of the oxide film.…”
Section: Introductionmentioning
confidence: 99%
“…Wang et al [9] deposited ZnO thin films on (0 0 0 1) LiNbO 3 substrates by MOCVD. Structural and morphological properties of as-grown and the annealed ZnO thin films were investigated.…”
Section: Introductionmentioning
confidence: 99%