2009
DOI: 10.1016/j.jallcom.2009.03.140
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Influence of heat treatment on the nanocrystalline structure of ZnO film deposited on p-Si

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Cited by 82 publications
(50 citation statements)
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“…7, when the calcination temperature of the Mg 0.5 Zn 0.5 Gd 0.02 Fe 1.98 O 4 sample was increased from 973 to 1173 K, the average crystallite size (indicated by open squares) increased from 24.9 to 41.2 nm due to the coalescence of small grains through the grain boundary diffusion during calcination (Caglar et al 2009). This can increase the magnetization (Choodamani et al 2014), resulting in an increase of the SAR with temperature, as indicated by closed circles.…”
Section: Induction Heating Propertiesmentioning
confidence: 99%
“…7, when the calcination temperature of the Mg 0.5 Zn 0.5 Gd 0.02 Fe 1.98 O 4 sample was increased from 973 to 1173 K, the average crystallite size (indicated by open squares) increased from 24.9 to 41.2 nm due to the coalescence of small grains through the grain boundary diffusion during calcination (Caglar et al 2009). This can increase the magnetization (Choodamani et al 2014), resulting in an increase of the SAR with temperature, as indicated by closed circles.…”
Section: Induction Heating Propertiesmentioning
confidence: 99%
“…Nano-size polycrystalline and epitaxial ZnO films have been extensively fabricated by using several methods including pulse laser deposition [8,9], molecular beam epitaxy [10][11][12], magnetron sputtering [13,14], oxidation of metallic zinc films [15], sol-gel method [16], etc. The surface morphology, microstructure, film growth, electrical and optical properties of ZnO films can be affected by the experimental conditions, such as substrates, fabrication methods, oxygen flow rate, and element doping [17][18][19][20][21], which can be ascribed to the change of the defects in the films. It is well known that the sputtering technology is an effective and the most widespread method for fabricating thin films in industry nowadays, and the oxygen flow rate can affect the intrinsic defects in the ZnO films during the film deposition significantly.…”
Section: Introductionmentioning
confidence: 99%
“…35 The calculated values of d for all the films are also given in Table I. The smaller FWHM and larger D values indicate better crystallization of the film.…”
Section: Resultsmentioning
confidence: 99%