Abstract:Alloys containing aluminium and silicon are of wide use. Due to their abundance, these elements are promising contributors to technical materials. A combinatorial thin‐film approach (silicon content within 27 at.% and 65 at.%, and aluminium between 35 at.% and 73 at.%, deposited by simultaneous co‐sputtering) is chosen for systematic investigations of reactions and compositions of high‐silicon containing alloys with aluminium. As the melting points of silicon and aluminium are far from each other and, furtherm… Show more
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