We present the observation of strain induced sign reversal of anisotropic magnetoresistance (AMR) in La 0.7 Ca 0.3 MnO 3 (LCMO) ultrathin films (thickness ~4 nm) deposited on SrTiO 3 (001) substrate (STO). We have also observed unusually large AMR (~24%) in LCMO/STO thin films with thickness of 6 nm below but close to its Curie temperature (T C ) which decrease as the film thickness increases. The sign reversal of AMR (with a maximum value of -6 %) with magnetic field or temperature for the 4 nm thin film may be attributed to the increase in tensile strain in the plane of the thin film which in turn facilitates the rotation of the magnetization easy axis.Anisotropic magnetoresistance (AMR) in manganites has attracted much attention due to its two-fold importance: (i) AMR properties can be used for exploring the physics due to the complex coupling between charge, spin and orbital states and (ii) possibility of its use devices like magnetic field sensors, low-cost inertial navigation systems and magnetoresistive random access memory (MRAM) 1-3 , etc. Tremendous efforts have been devoted to obtain large values of AMR near room temperature. Spin-orbit coupling due to the double exchange interaction 4-7 is considered as one of the possible explanation for the origin of anisotropy in manganite thin films. It is possible to tune the AMR 18 either through intrinsic strains (e.g., doping, structural manipulations, strain induction, etc.) or through extrinsic strains (e.g., application of external electric or magnetic fields, temperature variation, etc.). Recently, several groups have reported strain induced AMR and the effect of strain on the metal to insulator transition T P in manganites thin films 4-10 . It is found that the othorhombic La 0.7 Ca 0.3 MnO 3 (LCMO) with an in-plane lattice constant 3.863 Å can be grown on SrTiO 3 (001) substrate (STO), which has the cubic structure with a lattice constant 3.905 Å such that the lattice mismatch between the STO and the LCMO is only ~1%. AMR has been found to be remarkably large in highly strained ultrathin films as compared to the AMR in thicker films 1,5,6,[9][10][11][12] at certain temperatures below their ferromagnetic Curie temperature (T C ) which is attributed to the increase in the strain as the thickness of the film decreases 12, 13 . In this paper, anisotropy in epitaxial LCMO ultrathin films (4 nm, 6 nm and 8 nm) grown on STO (001) substrate is investigated. For a comparison, a relatively thicker film (~50 nm) is also investigated. Ultrathin films of LCMO down to 3 nm were deposited on STO substrates from a sintered target, using a KrF-Pulsed Laser Deposition (PLD) system with λ = 248 nm and energy density 7 of ~2 Jcm -2 . The typical lateral sizes of the LCMO films were 100 μm × 2 mm. The thin films were patterned with gold pads for electrical resistivity measurements (four probe) using optical lithography and ion beam milling process.Magnetization of the thin films, as a function of temperature and applied magnetic field was measured using a SQUID-VSM (QD, U...