2004 IEEE Radiation Effects Data Workshop (IEEE Cat. No.04TH8774)
DOI: 10.1109/redw.2004.1352916
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Angular effects in proton-induced single-event upsets in silicon-on-sapphire and silicon-on-insulator devices

Abstract: A b s f r e W e present new data in the ongoing ef€oH to b m d the effect of proton angle of incidence on the singleevent upset (SEU) rate in silicon-on-sapphire (SOS) and silicon-on-insulator (SO0 devices.

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Cited by 3 publications
(2 citation statements)
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“…Decrease in single-event cross section with increasing angle can also occur in sensitive volumes that have certain aspect ratios (depth comparable to or greater than the areal dimension) [3], [4]. High aspect ratio sensitive volumes have also been observed in thin-film silicon-on-insulator devices [5]. The SRAM studied in this work is not SOI and does not use deep trench isolation, and the transistor junctions do not have extreme aspect ratios.…”
Section: Introductionmentioning
confidence: 76%
“…Decrease in single-event cross section with increasing angle can also occur in sensitive volumes that have certain aspect ratios (depth comparable to or greater than the areal dimension) [3], [4]. High aspect ratio sensitive volumes have also been observed in thin-film silicon-on-insulator devices [5]. The SRAM studied in this work is not SOI and does not use deep trench isolation, and the transistor junctions do not have extreme aspect ratios.…”
Section: Introductionmentioning
confidence: 76%
“…The interest seems to be mainly focused on proton-induced SEE [18], [19], but some heavy ions data have also been reported [20], [21]. For these advanced devices, funneling effect does not apply [22] and in most cases the observed angular effects are interpreted in term of nuclear reactions.…”
Section: Introductionmentioning
confidence: 99%