Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis

Schröder, Sven; Herffurth, Tobias; Trost, Marcus; Duparré, Angela

doi:10.1364/ao.49.001503

Cited by 37 publications

(26 citation statements)

References 32 publications

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“…This is supported by the fact that different approaches of advanced EUV and XUV metrology are under investigation at our partners based on our EUV-Lamp. 7,8 As an example, high brightness source development can be based on soft-x-ray sources realized for operation Berlin and Stockholm. With our experience on development, manufacturing and servicing world-wide installation EUV-source suggests a straight forward adaptation to EUV source with 100-1000 W/(mm² sr).. With our proprietary concepts, e.g.…”

Section: Discussionmentioning

confidence: 99%

Contributions to EUV mask metrology infrastructure

et al. 2010

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There is a strong demand for stand alone actinic tools for high volume manufacturing of EUV mask infrastructure. Among such metrology tools reflectometry, blank inspection, mask defect and pattern inspection are of special need to be in pilot lines of EUVL roadmaps expected to prepare production in 2012 to 213. With existing lab sources and metrology tool technology we expect to make significant contributions. With the existing EUV-reflectometer developed for mask blank characterization accuracies of < 0.1 % in peak reflectivity precision and 0.002 nm for centroid wavelength (CWL-50. 1 ) are routinely achieved on both reflective multilayer coated and absorbers coated blanks. Furthermore, new upgrades for fiducial mark detection in the reflectometer allow for measurements on structured masks with precise positioning (better than 50 m). Meanwhile, detail studies on reproducibility and sensibility of measurement versus tilt angle have been performed. These studies shows le ss than 1% change in peak reflectometry due to 500 rad tilt, while accuracy of alignment is <100 rad. We will demonstrate our recent achievements and further plans to along the roadmap requirements. Actinic mask blank defect inspection is considered crucial and is required at mask blank suppliers and perhaps in mask houses. For this aim, a proof of concept experiment based on an EUV microscope has been set up. The first results are presented together with tool extrapolation. We analyze the achievable defect resolving power and its localization with limited performance state-of-the-art collecting objectives. Possible alternative approaches are discussed

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Section: Discussionmentioning

confidence: 99%

Contributions to EUV mask metrology infrastructure

et al. 2010

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“…Due to the strong scattering of air in the EUV band, a vacuum chamber is usually required for such an instrument. Schröder et al 9 present an angle-resolved scattering and reflectance measurement instrument working at a 13.5-nm wavelength to inspect the surfaces of optical components. Georgiev and Butler 10 presented long-term calibration monitoring of BRDF for Spectralon ® diffuser samples ranging from 230-to 450-nm wavelengths.…”

Section: Related Workmentioning

confidence: 99%

Measuring spatially varying, multispectral, ultraviolet bidirectional reflectance distribution function with an imaging spectrometer

Lyu

Liao

et al. 2016

Opt. Eng

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Abstract. The bidirectional reflectance distribution function (BRDF) data in the ultraviolet (UV) band are valuable for many applications including cultural heritage, material analysis, surface characterization, and trace detection. We present a BRDF measurement instrument working in the near-and middle-UV spectral range. The instrument includes a collimated UV light source, a rotation stage, a UV imaging spectrometer, and a control computer. The data captured by the proposed instrument describe spatial, spectral, and angular variations of the light scattering from a sample surface. Such a multidimensional dataset of an example sample is captured by the proposed instrument and analyzed by a k -mean clustering algorithm to separate surface regions with same material but different surface roughnesses. The clustering results show that the angular dimension of the dataset can be exploited for surface roughness characterization. The two clustered BRDFs are fitted to a theoretical BRDF model. The fitting results show good agreement between the measurement data and the theoretical model. © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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“…Several instruments for highly sensitive ARS measurements in the visible spectral range have been developed at Fraunhofer IOF [11,17,18] and elsewhere [3,4,9,16]. Special setups even exist for the deep and extreme ultraviolet regions [19][20][21] and the mid-and far infrared [22][23][24].…”

Section: Light Scattering Measurementsmentioning

confidence: 99%