Angle position monitoring technology of micro-mirror array for freeform illumination module in immersion lithography

Ma, Xinwen; Zhang, Fang; Zeng, Zongshun; Zhu, Siyu; Zeng, Aijun; Huang, Huijie

doi:10.1117/12.2501223

Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018) 2018

DOI: 10.1117/12.2501223

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Angle position monitoring technology of micro-mirror array for freeform illumination module in immersion lithography

Xinwen Ma

Fang Zhang

Zongshun Zeng

et al.

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2020

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Constrained pupil balance compensation for specific lithographic illuminator settings

Rui

Yang

2020

Appl. Opt.

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Pupil energy balances have always been considered significant elements for emersion lithography generally due to the large angle of incidence and offset imaging field. Those imbalances impact on exposure uniformity and decay pattern resolution. To overcome such shortcomings, a study on pupil compensation is discussed in this manuscript. A computational method based on a constrained optimization solution is proposed. By using a self-designed optical model of a zoomed system incorporating axicon lenses, a series of computations are developed and discussed. Also, the validity of our compensation method has been fully verified by simulations under multiple illumination settings.

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Constrained pupil balance compensation for specific lithographic illuminator settings

Rui

Yang

2020

Appl. Opt.

View full text Add to dashboard Cite

show abstract

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Angle position monitoring technology of micro-mirror array for freeform illumination module in immersion lithography

Cited by 1 publication

References 4 publications

Constrained pupil balance compensation for specific lithographic illuminator settings

Constrained pupil balance compensation for specific lithographic illuminator settings

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