The angle-insensitive
and tunable nature of metal–insulator–metal
slits makes them an interesting candidate for plasmonic displays and
colorant applications. The realization of these structures in the
visible regime and over reasonably large areas has only been recently
possible due to advances in nanofabrication. However, previous demonstrations
are of inverted grooves etched into a dielectric, coated with
a metal and then probed from the substrateleaving them
unable to be tuned postfabrication, as the regions of confined fields
become inaccessible. Second, these demonstrations use area and time-limited
fabrication processes such as EBL or FIB milling. Here, we demonstrate
8 in. wafer scale angle-insensitive plasmonic color through vertical
metal–insulator–metal slit waveguides in which the resulting
resonances can be accessed and tuned through external media. To illustrate
this, we use atomic layer deposition to change the effective refractive
index of the surrounding media and tune resonance locations throughout
the entire visible regime. The tunable single-peak absorption resonance
results in the reproduction of the cyan, yellow, and magenta (CYM)
color space. The system’s angle insensitivity and large scale
allow the creation of polarization-dependent images and logos which
can find use in novel plasmonic optical components and further demonstrate
the potential of such systems to be integrated with dynamically tunable
optical media.