Analytical calculation of site and surface reaction probabilities of SiH<sub>x</sub>radicals in PECVD process

Babahani, Oumelkheir; Khelfaoui, F.; Meftah, Mohammed Tayeb

doi:10.1051/epjap/2013120345

Cited by 2 publications

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“…In our previous works [20][21][22][23][24], we were interested in the study of the gas phase and the interaction of plasmas with the surface, for SiH 4 /H 2 and CH 4 /H 2 gas mixtures during PECVD processes. The used numerical simulation techniques were MCS and MDS.…”

Section: Simulation Work On the Pecvd Using Mcs And Mdsmentioning

confidence: 99%

How to Use the Monte Carlo Simulation Technique? Application: A Study of the Gas Phase during Thin Film Deposition

Khelfaoui¹,

Babahani²

2019

Theory, Application, and Implementation of Monte Carlo Method in Science and Technology

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Many physical phenomena can be modeled using Monte Carlo simulation (MCS) because it is a powerful tool to study thermodynamic properties. MCS can be used to simulate interactions between several particles or bodies in the presence of local or external fields. The main idea is to create a high number of different random configurations; statistics can be taken according to appropriate algorithms (Metropolis algorithm). In this chapter, we present basic techniques of MCS as the choice of potential, reaction rates, simulation cell, random configurations, and algorithms. We present some principal ideas of MCS used to study particle-particle collisions in the gas and in plasmas. Other MCS techniques are presented briefly. A numerical application is presented for collisions in gas phase during thin film deposition by plasmaenhanced chemical vapor deposition (PECVD) processes. Parameters and results of the simulation are studied according to a chosen reactor and mixture.

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Section: Simulation Work On the Pecvd Using Mcs And Mdsmentioning

confidence: 99%

How to Use the Monte Carlo Simulation Technique? Application: A Study of the Gas Phase during Thin Film Deposition

Khelfaoui¹,

Babahani²

2019

Theory, Application, and Implementation of Monte Carlo Method in Science and Technology

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View full text Add to dashboard Cite

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Monte Carlo Simulation of Chemical Reactions in Plasma Enhanced Chemical Vapor Deposition: from Microscopic View to Macroscopic Results

Babahani

Hadjadj

Khelfaoui

et al. 2018

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Analytical calculation of site and surface reaction probabilities of SiH_xradicals in PECVD process

Cited by 2 publications

References 20 publications

How to Use the Monte Carlo Simulation Technique? Application: A Study of the Gas Phase during Thin Film Deposition

How to Use the Monte Carlo Simulation Technique? Application: A Study of the Gas Phase during Thin Film Deposition

Monte Carlo Simulation of Chemical Reactions in Plasma Enhanced Chemical Vapor Deposition: from Microscopic View to Macroscopic Results

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Analytical calculation of site and surface reaction probabilities of SiHxradicals in PECVD process

Cited by 2 publications

References 20 publications

How to Use the Monte Carlo Simulation Technique? Application: A Study of the Gas Phase during Thin Film Deposition

How to Use the Monte Carlo Simulation Technique? Application: A Study of the Gas Phase during Thin Film Deposition

Monte Carlo Simulation of Chemical Reactions in Plasma Enhanced Chemical Vapor Deposition: from Microscopic View to Macroscopic Results

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Analytical calculation of site and surface reaction probabilities of SiH_xradicals in PECVD process